Crossref
journal-article
IOP Publishing
Plasma Sources Science and Technology (266)
References
16
Referenced
42
10.1049/el:19870160
/ Electron. Lett. by Curtins H (1987)10.1557/PROC-118-117
/ Mater. Res. Soc. Symp. Proc. by Oda S (1988)10.1557/PROC-149-447
/ Mater. Res. Soc. Symp. Proc. by Chatham H (1989)10.1116/1.572805
10.1143/JJAP.28.L1860
/ Japan. J. Appl. Phys. by Oda S (1989)10.1088/0022-3727/16/12/024
/ J. Phys. D: Appl. Phys. by Ferreira C M (1983){'key': '7', 'first-page': '437', 'author': 'Ernie D W', 'year': '1991'}
by Ernie D W (1991)10.1063/1.106112
10.1088/0963-0252/2/1/010
/ Plasma Sources Sci. Technol. by Kitamura T (1993)10.1143/JJAP.29.1889
/ Japan. J. Appl. Phys. by Oda S (1990)10.1143/JJAP.27.1560
/ Japan. J. Appl. Phys. by Kondo K (1988){'key': '12', 'first-page': '147', 'author': 'Yasukawa M', 'year': '1992'}
by Yasukawa M (1992){'key': '13', 'author': 'Howling A A', 'journal-title': 'J. Vac. Sci. Technol.'}
/ J. Vac. Sci. Technol. by Howling A A{'key': '14', 'first-page': '189', 'author': 'Oda S', 'year': '1991'}
by Oda S (1991)10.1016/S0022-3093(05)80211-X
/ J. Non-Cryst. Solids by Oda S (1991)10.1116/1.578205
Dates
Type | When |
---|---|
Created | 23 years ago (Aug. 25, 2002, 6:37 a.m.) |
Deposited | 5 years, 4 months ago (April 10, 2020, 7:23 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 7:43 p.m.) |
Issued | 32 years, 7 months ago (Feb. 1, 1993) |
Published | 32 years, 7 months ago (Feb. 1, 1993) |
Published Online | 26 years, 8 months ago (Jan. 1, 1999) |
Published Print | 32 years, 7 months ago (Feb. 1, 1993) |
@article{Oda_1993, title={Frequency effects in processing plasmas of the VHF band}, volume={2}, ISSN={1361-6595}, url={http://dx.doi.org/10.1088/0963-0252/2/1/007}, DOI={10.1088/0963-0252/2/1/007}, number={1}, journal={Plasma Sources Science and Technology}, publisher={IOP Publishing}, author={Oda, S}, year={1993}, month=feb, pages={26–29} }