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Gogotsi, Y., Baek, C., & Kirscht, F. (1999). Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon. Semiconductor Science and Technology, 14(10), 936–944.

Authors 3
  1. Y Gogotsi (first)
  2. C Baek (additional)
  3. F Kirscht (additional)
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Dates
Type When
Created 23 years ago (Aug. 25, 2002, 6:02 a.m.)
Deposited 5 years, 4 months ago (April 10, 2020, 5:45 p.m.)
Indexed 1 week, 3 days ago (Aug. 19, 2025, 7:11 a.m.)
Issued 25 years, 11 months ago (Sept. 14, 1999)
Published 25 years, 11 months ago (Sept. 14, 1999)
Published Online 25 years, 11 months ago (Sept. 14, 1999)
Published Print 25 years, 10 months ago (Oct. 1, 1999)
Funders 0

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@article{Gogotsi_1999, title={Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon}, volume={14}, ISSN={1361-6641}, url={http://dx.doi.org/10.1088/0268-1242/14/10/310}, DOI={10.1088/0268-1242/14/10/310}, number={10}, journal={Semiconductor Science and Technology}, publisher={IOP Publishing}, author={Gogotsi, Y and Baek, C and Kirscht, F}, year={1999}, month=sep, pages={936–944} }