DOI: 10.1088/0268-1242/11/2/017. Tin sulphide films deposited by plasma-enhanced chemical vapour deposition

Tin sulphide films deposited by plasma-enhanced chemical vapour deposition

10.1088/0268-1242/11/2/017

Crossref journal-article

IOP Publishing

Semiconductor Science and Technology (266)

Bibliography

Ortiz, A., Alonso, J. C., Garcia, M., & Toriz, J. (1996). Tin sulphide films deposited by plasma-enhanced chemical vapour deposition. Semiconductor Science and Technology, 11(2), 243â247.

Authors 4

A Ortiz (first)
J C Alonso (additional)
M Garcia (additional)
J Toriz (additional)

References 20 Referenced 115

10.1002/pssb.2221350130 / Phys. Status Solidi by Valiukonis G (1990)
10.1088/0022-3727/24/1/016 / J. Phys. D: Appl. Phys. by Nair P K (1991)
{'key': '3', 'first-page': '77', 'volume': '27', 'author': 'Lofersky J J', 'year': '1956', 'journal-title': 'J. Appl. Phys.'} / J. Appl. Phys. by Lofersky J J (1956)
10.1016/0022-3697(60)90253-5
10.1524/zkri.1935.92.1.161 / Z. Kristallogr. by Hoffman W (1935)
10.1016/0038-1098(83)90318-6
10.1002/pssb.2221370218 / Phys. Status Solidi by Lukes F (1986)
10.1103/PhysRevB.41.5227
10.1016/0022-3697(86)90059-4
10.1149/1.2100274 / J. Electrochem. Soc. by Engelken R D (1987)
10.1088/0268-1242/6/2/014 / Semicond. Sci. Technol. by Nair M T S (1991)
10.1088/0268-1242/9/11/016 / Semicond. Sci. Technol. by Lopez S (1994)
10.1016/0165-1633(89)90048-8 / Solar Energy Mater. by Ortiz A (1989)
10.1016/0022-3093(94)00482-X
10.1016/0042-207X(92)90149-Q
{'key': '16', 'first-page': '135', 'volume': '26', 'author': 'Adams A C', 'year': '1983', 'journal-title': 'Solid State Technol.', 'ISSN': 'http://id.crossref.org/issn/0038-111X', 'issn-type': 'print'} / Solid State Technol. by Adams A C (1983)
10.1149/1.2423333 / J. Electrochem Soc. by Pliskin W A (1965)
10.1103/PhysRevB.38.9895
10.1116/1.579405
10.1088/0268-1242/4/5/009 / Semicond. Sci. Technol. by Elkorashy A M (1989)

Dates

Type	When
Created	22 years, 11 months ago (Aug. 25, 2002, 6:02 a.m.)
Deposited	1 year, 7 months ago (Jan. 4, 2024, 5:43 p.m.)
Indexed	1 month ago (July 19, 2025, 11:41 p.m.)
Issued	29 years, 6 months ago (Feb. 1, 1996)
Published	29 years, 6 months ago (Feb. 1, 1996)
Published Online	26 years, 7 months ago (Jan. 1, 1999)
Published Print	29 years, 6 months ago (Feb. 1, 1996)

Funders 0

None

BibTeX

@article{Ortiz_1996, title={Tin sulphide films deposited by plasma-enhanced chemical vapour deposition}, volume={11}, ISSN={1361-6641}, url={http://dx.doi.org/10.1088/0268-1242/11/2/017}, DOI={10.1088/0268-1242/11/2/017}, number={2}, journal={Semiconductor Science and Technology}, publisher={IOP Publishing}, author={Ortiz, A and Alonso, J C and Garcia, M and Toriz, J}, year={1996}, month=feb, pages={243–247} }

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