DOI: 10.1088/0022-3727/9/4/016. Direct measurement of contamination and etching rates in an electron beam

Direct measurement of contamination and etching rates in an electron beam

10.1088/0022-3727/9/4/016

Crossref journal-article

IOP Publishing

Journal of Physics D: Applied Physics (266)

Bibliography

Egerton, R. F., & Rossouw, C. J. (1976). Direct measurement of contamination and etching rates in an electron beam. Journal of Physics D: Applied Physics, 9(4), 659â663.

Authors 2

R F Egerton (first)
C J Rossouw (additional)

References 16 Referenced 31

{'key': '1', 'first-page': '76', 'volume': '255', 'author': 'Castaing R', 'year': '1962', 'journal-title': 'C.R. Acad. Sci., Paris'} / C.R. Acad. Sci., Paris by Castaing R (1962)
{'key': '2', 'author': 'Chadderton L T', 'year': '1965'} by Chadderton L T (1965)
{'key': '3', 'author': 'Ditchfield R W', 'year': '1972'} by Ditchfield R W (1972)
10.1080/14786437508229296 / Phil. Mag. by Egerton R F (1975)
{'key': '5', 'first-page': '384', 'volume': 'vol 1', 'author': 'Egerton R F', 'year': '1974'} by Egerton R F (1974)
10.1088/0508-3443/4/4/302 / Br. J. Appl. Phys. by Ennos A E (1953)
10.1088/0508-3443/5/1/307 / Br. J. Appl. Phys. by Ennos A E (1954)
{'key': '8', 'author': 'Heide H G', 'year': '1958'} by Heide H G (1958)
{'key': '9', 'first-page': '116', 'volume': '15', 'author': 'Heide H G', 'year': '1963', 'journal-title': 'Z. Angew. Phys.', 'ISSN': 'http://id.crossref.org/issn/0044-2283', 'issn-type': 'print'} / Z. Angew. Phys. by Heide H G (1963)
10.1063/1.1715049
10.1007/BFb0045738 / Springer Tracts in Mod. Phys. by Raether H (1965)
{'key': '12', 'first-page': '27', 'author': 'Schott O', 'year': '1956'} by Schott O (1956)
10.1103/PhysRev.45.488
10.1016/0008-6223(65)90016-3
10.1063/1.1697597
10.1088/0022-3727/2/12/318 / J. Phys. D: Appl. Phys. by Wittry D B (1969)

Dates

Type	When
Created	23 years ago (July 26, 2002, 5:01 p.m.)
Deposited	5 years, 4 months ago (April 10, 2020, 10:13 p.m.)
Indexed	2 months ago (June 20, 2025, 3:06 a.m.)
Issued	49 years, 5 months ago (March 11, 1976)
Published	49 years, 5 months ago (March 11, 1976)
Published Online	24 years, 6 months ago (Jan. 25, 2001)
Published Print	49 years, 5 months ago (March 11, 1976)

Funders 0

None

BibTeX

@article{Egerton_1976, title={Direct measurement of contamination and etching rates in an electron beam}, volume={9}, ISSN={1361-6463}, url={http://dx.doi.org/10.1088/0022-3727/9/4/016}, DOI={10.1088/0022-3727/9/4/016}, number={4}, journal={Journal of Physics D: Applied Physics}, publisher={IOP Publishing}, author={Egerton, R F and Rossouw, C J}, year={1976}, month=mar, pages={659–663} }

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