Abstract
We report on the growth of modulation-doped GaAs/Alx Ga1−xAs heterostructures with mobilities (μ) on the order of 1×106 cm2 /V s (at 4.2 K) and areal densities (ns ) below 8×1010 cm−2 . In growing these structures we employ the atomic plane doping technique and ultrathick (>1000 Å) spacer layers. The mobilities of these structures are the highest ever reported for low densities. Measurements of μ vs ns as a function of illumination or gate voltage indicate μ∼nαs behavior with α≂0.6 and, even for ns ≂1.4×1010 cm−2 , μ has a value in excess of 0.3×106 cm2 /V s.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:48 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 2, 2024, 5:40 p.m.) |
Indexed | 1 year, 1 month ago (July 26, 2024, 6:31 p.m.) |
Issued | 37 years, 5 months ago (March 28, 1988) |
Published | 37 years, 5 months ago (March 28, 1988) |
Published Print | 37 years, 5 months ago (March 28, 1988) |
@article{Shayegan_1988, title={Growth of low-density two-dimensional electron system with very high mobility by molecular beam epitaxy}, volume={52}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.99219}, DOI={10.1063/1.99219}, number={13}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Shayegan, M. and Goldman, V. J. and Jiang, C. and Sajoto, T. and Santos, M.}, year={1988}, month=mar, pages={1086–1088} }