Abstract
In GaAs-GaAsP strained-layer superlattices grown lattice matched to GaAs are effective buffer layers in reducing dislocations in epitaxial GaAs films grown on Si substrates. The strained-layer superlattice structure permits high values of strain to be employed without the strained-layer superlattice generating dislocations of its own. We find that the strained-layer superlattice buffer is extremely effective in blocking threading dislocations of low density and is less effective when the dislocation is high. It appears that for a given strained-layer superlattice there is a finite capacity for blocking dislocations. Transmission electron microscopy has been used to investigate the role of the superlattice buffer layer.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:48 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 2, 2024, 5:06 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 10, 2024, 8:58 p.m.) |
Issued | 37 years, 9 months ago (Nov. 16, 1987) |
Published | 37 years, 9 months ago (Nov. 16, 1987) |
Published Print | 37 years, 9 months ago (Nov. 16, 1987) |
@article{El_Masry_1987, title={Effectiveness of strained-layer superlattices in reducing defects in GaAs epilayers grown on silicon substrates}, volume={51}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.98570}, DOI={10.1063/1.98570}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={El-Masry, N. and Tarn, J. C. L. and Humphreys, T. P. and Hamaguchi, N. and Karam, N. H. and Bedair, S. M.}, year={1987}, month=nov, pages={1608–1610} }