Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

The critical thickness hc of strained InxGa1−xAs layers grown by molecular beam epitaxy on GaAs(100) substrates is determined by double-crystal x-ray diffraction for 0.07≤x≤0.25. The experimental results are in good agreement with critical thicknesses calculated from the energy balance model of R. People and J. C. Bean [Appl. Phys. Lett. 47, 322 (1985)] but differ from prior photoluminescence measurements of hc for this material. Beyond the critical thickness the transition from the strained to the relaxed state occurs more rapidly as the In concentration and hence the lattice mismatch increases.

Bibliography

Orders, P. J., & Usher, B. F. (1987). Determination of critical layer thickness in InxGa1−xAs/GaAs heterostructures by x-ray diffraction. Applied Physics Letters, 50(15), 980–982.

Authors 2
  1. P. J. Orders (first)
  2. B. F. Usher (additional)
References 11 Referenced 179
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 8:48 a.m.)
Deposited 1 year, 6 months ago (Feb. 2, 2024, 4:39 p.m.)
Indexed 1 month ago (July 24, 2025, 8 a.m.)
Issued 38 years, 4 months ago (April 13, 1987)
Published 38 years, 4 months ago (April 13, 1987)
Published Print 38 years, 4 months ago (April 13, 1987)
Funders 0

None

@article{Orders_1987, title={Determination of critical layer thickness in InxGa1−xAs/GaAs heterostructures by x-ray diffraction}, volume={50}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.98004}, DOI={10.1063/1.98004}, number={15}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Orders, P. J. and Usher, B. F.}, year={1987}, month=apr, pages={980–982} }