Abstract
Low-energy ion doping of nitrogen has been employed in the molecular beam epitaxial (MBE) growth of ZnSe on GaAs substrates in an attempt to obtain p-type crystals. Low-temperature photoluminescence (PL) measurements of the N-doped ZnSe indicated a formation of shallow acceptors with an activation energy around 110 meV. The PL spectrum in the excitonic emission region was dominated by an acceptor bound-exciton emission I1 at 2.790 eV, suggesting a remarkable increase of an acceptor concentration in comparison with the previous work by MBE using a neutral doping source.
References
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:46 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 11:20 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 11:41 a.m.) |
Issued | 38 years, 9 months ago (Nov. 17, 1986) |
Published | 38 years, 9 months ago (Nov. 17, 1986) |
Published Print | 38 years, 9 months ago (Nov. 17, 1986) |
@article{Mitsuyu_1986, title={Photoluminescence properties of nitrogen-doped ZnSe layers grown by molecular beam epitaxy with low-energy ion doping}, volume={49}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.97374}, DOI={10.1063/1.97374}, number={20}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Mitsuyu, T. and Ohkawa, K. and Yamazaki, O.}, year={1986}, month=nov, pages={1348–1350} }