Abstract
We report quantitative studies of hot-electron trapping by DX centers in short channel GaAs/n-AlxGa1−x As field-effect transistors. A remarkable result is that persistent hot-electron capture occurs even at very low values of the Al mole fraction, x≲0.2, where thermal capture is not observed. Thermal emission studies confirm that the trap state is associated with the DX center. Thus, for x≲0.2 the trap state is metastable, but can be persistently populated by heating the free electrons with an electric field. This and other features of the capture process support a large lattice relaxation model of the center.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:46 a.m.) |
Deposited | 1 year, 7 months ago (Feb. 2, 2024, 4:25 p.m.) |
Indexed | 5 months ago (March 29, 2025, 12:12 p.m.) |
Issued | 38 years, 9 months ago (Dec. 1, 1986) |
Published | 38 years, 9 months ago (Dec. 1, 1986) |
Published Print | 38 years, 9 months ago (Dec. 1, 1986) |
@article{Theis_1986, title={Hot-electron capture to D X centers in AlxGa1−xAs at low Al mole fractions (x<0.2)}, volume={49}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.97276}, DOI={10.1063/1.97276}, number={22}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Theis, T. N. and Parker, B. D. and Solomon, P. M. and Wright, S. L.}, year={1986}, month=dec, pages={1542–1544} }