Abstract
Mobilities and sheet carrier densities of single interface, modulation-doped AlGaAs-GaAs heterostructures depend on the structure and molecular beam epitaxial growth parameters. Variation of the thickness of the undoped spacer between 20 and 360 Å gave electron densities in the range 1012–2×1011 cm−2 in two-dimensional electron gases. Thick spacers resulted in high 4.2-K mobilities of 1.2×106 cm2/Vs in dark and 1.8×106 cm2/Vs under illumination with corresponding channel densities of 2.3×1011 cm−2 and 3.9×1011 cm−2, respectively. Two-dimensional hole gases had mobilities of 83 000 cm2/Vs and hole concentrations of 2.7×1011 cm−2 at 4.2 K.
References
8
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:03 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 9:41 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 10:10 a.m.) |
Issued | 40 years, 6 months ago (Feb. 15, 1985) |
Published | 40 years, 6 months ago (Feb. 15, 1985) |
Published Print | 40 years, 6 months ago (Feb. 15, 1985) |
@article{Weimann_1985, title={Molecular beam epitaxial growth and transport properties of modulation-doped AlGaAs-GaAs heterostructures}, volume={46}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.95916}, DOI={10.1063/1.95916}, number={4}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Weimann, G. and Schlapp, W.}, year={1985}, month=feb, pages={411–413} }