DOI: 10.1063/1.95243. Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching

Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching

10.1063/1.95243

Crossref journal-article

AIP Publishing

Applied Physics Letters (317)

Abstract

Silicon surfaces which had been exposed to a CF4 /H2 plasma have been characterized by x-ray photoelectron spectroscopy, ellipsometry, He ion channeling, and H profiling techniques. Plasma exposure leads to the deposition of a thin (∼30 Å thick) C,F-polymeric layer. Hydrogen and/or damage (displaced Si atoms) can be detected in the near-surface region up to a depth in excess of 400 Å from the Si surface.

Bibliography

Oehrlein, G. S., Tromp, R. M., Lee, Y. H., & Petrillo, E. J. (1984). Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching. Applied Physics Letters, 45(4), 420â422.

Authors 4

G. S. Oehrlein (first)
R. M. Tromp (additional)
Y. H. Lee (additional)
E. J. Petrillo (additional)

References 13 Referenced 92

10.1146/annurev.ms.13.080183.000515 / Ann. Rev. Mater. Sci. (1983)
10.1149/1.2124301 / J. Electrochem. Soc. (1982)
10.1149/1.2119559 / J. Electrochem Soc. (1983)
10.1063/1.332437 / J. Appl. Phys. (1983)
{'key': '2024020514223806000_r5'}
10.1063/1.88826 / Appl. Phys. Lett. (1976)
10.1080/10408437808243616 / CRC Crit. Rev. Solid State (1978)
10.1364/JOSA.52.000970 / J. Opt. Soc. Am. (1962)
{'key': '2024020514223806000_r9'}
{'key': '2024020514223806000_r10'}
{'key': '2024020514223806000_r11', 'first-page': '738', 'volume': '19', 'year': '1968', 'journal-title': 'Int. J. Appl. Rad. a. Isotop.'} / Int. J. Appl. Rad. a. Isotop. (1968)
10.1016/S0031-8914(56)90039-8 / Physica (1956)
{'key': '2024020514223806000_r11b', 'first-page': '135', 'volume': '38', 'year': '1972', 'journal-title': 'Phys. Lett. A'} / Phys. Lett. A (1972)

Dates

Type	When
Created	22 years, 6 months ago (Feb. 13, 2003, 4:54 p.m.)
Deposited	1 year, 6 months ago (Feb. 5, 2024, 9:22 a.m.)
Indexed	2 months, 1 week ago (June 25, 2025, 5:06 p.m.)
Issued	41 years ago (Aug. 15, 1984)
Published	41 years ago (Aug. 15, 1984)
Published Print	41 years ago (Aug. 15, 1984)

Funders 0

None

BibTeX

@article{Oehrlein_1984, title={Study of silicon contamination and near-surface damage caused by CF4/H2 reactive ion etching}, volume={45}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.95243}, DOI={10.1063/1.95243}, number={4}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Oehrlein, G. S. and Tromp, R. M. and Lee, Y. H. and Petrillo, E. J.}, year={1984}, month=aug, pages={420–422} }

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