Abstract
The valence-band discontinuity between GaAs and AlxGa1−xAs (0.3≪x≪1.0) was determined from measurements on p+-GaAs-(Al,Ga)As-p−-GaAs capacitors from current-voltage measurements as a function of temperature. It was found that thermionic emission dominated the conduction process in these structures for temperatures above 140 K and for low bias voltages. The barrier height was determined from the slope of ln(J/T2) vs l/T. From this, a valence-band discontinuity of 35% of the total direct band-gap (EgΓ) discontinuity, being independent of the mole fraction x, between GaAs and (Al,Ga)As was calculated. The corresponding value for the conduction-band discontinuity, 65%, is considerably lower than the commonly accepted value of 85%.
References
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 13, 2003, 4:54 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 9:34 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 10, 2024, 6:02 a.m.) |
Issued | 40 years, 8 months ago (Dec. 1, 1984) |
Published | 40 years, 8 months ago (Dec. 1, 1984) |
Published Print | 40 years, 8 months ago (Dec. 1, 1984) |
@article{Arnold_1984, title={Determination of the valence-band discontinuity between GaAs and (Al,Ga)As by the use of p+-GaAs-(Al,Ga)As-p−-GaAs capacitors}, volume={45}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.95076}, DOI={10.1063/1.95076}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Arnold, D. and Ketterson, A. and Henderson, T. and Klem, J. and Morkoç, H.}, year={1984}, month=dec, pages={1237–1239} }