Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We have grown GaAs and AlGaAs on (100) oriented Si substrates by molecular beam epitaxy. The epitaxial growth was studied in situ by reflection high-energy electron diffraction. Low-temperature photoluminescence, Raman scattering, and scanning electron microscopy were used to characterize the epitaxial layers. It is shown for the first time that antiphase disorder could be suppressed. The doped AlGaAs grown directly on Si substrates exhibited PL efficiency similar to that of AlGaAs grown on GaAs substrates.

Bibliography

Wang, W. I. (1984). Molecular beam epitaxial growth and material properties of GaAs and AlGaAs on Si (100). Applied Physics Letters, 44(12), 1149–1151.

Authors 1
  1. W. I. Wang (first)
References 20 Referenced 207
  1. 10.1063/1.92976 / Appl. Phys. Lett. (1982)
  2. {'key': '2024020514142198400_r2'}
  3. 10.1063/1.94235 / Appl. Phys. Lett. (1983)
  4. 10.1103/PhysRevB.18.4402 / Phys. Rev. B (1978)
  5. 10.1016/0022-0248(79)90053-8 / J. Cryst. Growth (1979)
  6. 10.1063/1.91643 / Appl. Phys. Lett. (1980)
  7. 10.1116/1.571123 / J. Vac. Sci. Technol. (1981)
  8. 10.1116/1.571755 / J. Vac. Sci. Technol. (1982)
  9. {'key': '2024020514142198400_r9', 'first-page': '668', 'volume': '1', 'year': '1983', 'journal-title': 'J. Vac. Sci. Technol. B'} / J. Vac. Sci. Technol. B (1983)
  10. 10.1016/0039-6028(69)90062-4 / Surf. Sci. (1969)
  11. 10.1016/0039-6028(70)90153-6 / Surf. Sci. (1970)
  12. 10.1149/1.2134290 / J. Electrochem. Soc. (1975)
  13. 10.1143/JJAP.17.1043 / Japn. J. Appl. Phys. (1978)
  14. 10.1143/JJAP.21.L68 / Japn. J. Appl. Phys. (1982)
  15. 10.1016/0039-6028(64)90099-8 / Surf. Sci. (1964)
  16. 10.1016/0039-6028(80)90052-7 / Surf. Sci. (1980)
  17. 10.1116/1.570943 / J. Vac. Sci. Technol. (1981)
  18. 10.1016/0038-1098(82)90853-5 / Solid State Commun. (1982)
  19. 10.1063/1.91428 / Appl. Phys. Lett. (1980)
  20. 10.1063/1.1708117 / J. Appl. Phys. (1966)
Dates
Type When
Created 22 years, 6 months ago (Feb. 13, 2003, 4:47 p.m.)
Deposited 1 year, 7 months ago (Feb. 5, 2024, 9:15 a.m.)
Indexed 1 week ago (Aug. 29, 2025, 5:42 a.m.)
Issued 41 years, 2 months ago (June 15, 1984)
Published 41 years, 2 months ago (June 15, 1984)
Published Print 41 years, 2 months ago (June 15, 1984)
Funders 0

None

@article{Wang_1984, title={Molecular beam epitaxial growth and material properties of GaAs and AlGaAs on Si (100)}, volume={44}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.94673}, DOI={10.1063/1.94673}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Wang, W. I.}, year={1984}, month=jun, pages={1149–1151} }