Abstract
The microstructure of Czochralski silicon annealed at high temperatures has been investigated using high resolution transmission electron microscopy. After prolonged heat treatments at temperatures close to 1200 °C, two types of microdefects are observed: (a) small polyhedral oxide precipitates, with typical diameters of about 15 nm and facets along crystalline planes of the silicon matrix, and (b) planar faults along {111} planes which have been directly identified as extrinsic stacking faults bounded by Frank-type dislocations.
References
12
Referenced
56
10.1103/PhysRev.101.1264
/ Phys. Rev. (1956){'key': '2024020513522606600_r2'}
10.1080/14786437608223798
/ Philos. Mag. (1976)10.1063/1.323241
/ J. Appl. Phys. (1976){'key': '2024020513522606600_r5', 'first-page': '213', 'volume': '26', 'year': '1979', 'journal-title': 'Phys. Status Solidi A'}
/ Phys. Status Solidi A (1979){'key': '2024020513522606600_r6'}
{'key': '2024020513522606600_r7'}
{'key': '2024020513522606600_r8'}
{'key': '2024020513522606600_r9'}
10.1016/0022-0248(82)90474-2
/ J. Cryst. Growth (1982)10.1016/0022-0248(81)90518-2
/ J. Cryst. Growth (1981){'key': '2024020513522606600_r12'}
Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 13, 2003, 4:39 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 8:57 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 10, 2024, 5:27 p.m.) |
Issued | 41 years, 8 months ago (Dec. 1, 1983) |
Published | 41 years, 8 months ago (Dec. 1, 1983) |
Published Print | 41 years, 8 months ago (Dec. 1, 1983) |
@article{Ponce_1983, title={Structure of thermally induced microdefects in Czochralski silicon after high-temperature annealing}, volume={43}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.94232}, DOI={10.1063/1.94232}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Ponce, F. A. and Yamashita, T. and Hahn, S.}, year={1983}, month=dec, pages={1051–1053} }