Abstract
The room-temperature motion of gold-related centers in reverse-biased silicon n+p junction diodes has been observed using deep level transient spectroscopy. The concentration profile of the gold-related donor level (Ev +0.34 eV) is presented as a function of the duration of the electric field application. A mobility of 7.8±3.2×10−15 cm2 V−1 s−1 at 25 °C was obtained for this center. Under the same conditions, no movement was observed of the deep gold-related acceptor center (Ec −0.55 eV) in n-type silicon surface barrier diodes.
References
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 13, 2003, 4:25 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 8:33 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 9:10 a.m.) |
Issued | 42 years, 8 months ago (Dec. 15, 1982) |
Published | 42 years, 8 months ago (Dec. 15, 1982) |
Published Print | 42 years, 8 months ago (Dec. 15, 1982) |
@article{Pearton_1982, title={Motion of deep gold-related centers in reverse-biased silicon junction diodes at room temperature}, volume={41}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.93415}, DOI={10.1063/1.93415}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Pearton, S. J. and Tavendale, A. J.}, year={1982}, month=dec, pages={1148–1150} }