Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

A systematic study of the behavior of oxidized amorphous silicon layers as tunneling barriers in transition-metal-based superconducting tunnel junctions is reported. These barriers are found to work universally well, provided the native oxide of the base electrode has a sufficiently low conductance to block pinholes. For silicon layers larger than ∼2 nm the properties of the barriers are found to be independent of the base electrode and lead to a simple model of the barrier which should be useful for further applications.

Bibliography

Rudman, D. A., & Beasley, M. R. (1980). Oxidized amorphous-silicon superconducting tunnel junction barriers. Applied Physics Letters, 36(12), 1010–1013.

Authors 2
  1. D. A Rudman (first)
  2. M. R. Beasley (additional)
References 13 Referenced 66
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Dates
Type When
Created 22 years, 6 months ago (Feb. 13, 2003, 3:51 p.m.)
Deposited 1 year, 7 months ago (Feb. 5, 2024, 7:29 a.m.)
Indexed 1 year, 6 months ago (Feb. 10, 2024, 7:58 p.m.)
Issued 45 years, 2 months ago (June 15, 1980)
Published 45 years, 2 months ago (June 15, 1980)
Published Print 45 years, 2 months ago (June 15, 1980)
Funders 0

None

@article{Rudman_1980, title={Oxidized amorphous-silicon superconducting tunnel junction barriers}, volume={36}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.91666}, DOI={10.1063/1.91666}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Rudman, D. A and Beasley, M. R.}, year={1980}, month=jun, pages={1010–1013} }