Abstract
A systematic study of the behavior of oxidized amorphous silicon layers as tunneling barriers in transition-metal-based superconducting tunnel junctions is reported. These barriers are found to work universally well, provided the native oxide of the base electrode has a sufficiently low conductance to block pinholes. For silicon layers larger than ∼2 nm the properties of the barriers are found to be independent of the base electrode and lead to a simple model of the barrier which should be useful for further applications.
References
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 13, 2003, 3:51 p.m.) |
Deposited | 1 year, 7 months ago (Feb. 5, 2024, 7:29 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 10, 2024, 7:58 p.m.) |
Issued | 45 years, 2 months ago (June 15, 1980) |
Published | 45 years, 2 months ago (June 15, 1980) |
Published Print | 45 years, 2 months ago (June 15, 1980) |
@article{Rudman_1980, title={Oxidized amorphous-silicon superconducting tunnel junction barriers}, volume={36}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.91666}, DOI={10.1063/1.91666}, number={12}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Rudman, D. A and Beasley, M. R.}, year={1980}, month=jun, pages={1010–1013} }