Crossref
journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract
Thin (200–300 Å) cross sections of Si/SiO2 have been examined by transmission electron microscopy at a resolution of better than 10 Å to search for crystalline Si protrusions into, or islands in, the thermally grown SiO2. Within the resolution obtained, no evidence was found for any phase separation within the amorphous oxide layer.
References
7
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 13, 2003, 3:15 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 4:55 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 10:20 a.m.) |
Issued | 48 years, 7 months ago (Jan. 15, 1977) |
Published | 48 years, 7 months ago (Jan. 15, 1977) |
Published Print | 48 years, 7 months ago (Jan. 15, 1977) |
@article{Blanc_1977, title={The Si/SiO2 interface examined by cross-sectional transmission electron microscopy}, volume={30}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.89289}, DOI={10.1063/1.89289}, number={2}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Blanc, J. and Buiocchi, C. J. and Abrahams, M. S. and Ham, W. E.}, year={1977}, month=jan, pages={120–122} }