Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We report on a chemical free one-off imprinting method to fabricate two dimensional (2D) van der Waals (vdWs) materials based transistors. Such one-off imprinting technique is the simplest and effective way to prevent unintentional chemical reaction or damage of 2D vdWs active channel during device fabrication process. 2D MoS2 nanosheets based transistors with a hexagonal-boron-nitride (h-BN) passivation layer, prepared by one-off imprinting, show negligible variations of transfer characteristics after chemical vapor deposition process. In addition, this method enables the fabrication of all 2D MoS2 transistors consisting of h-BN gate insulator, and graphene source/drain and gate electrodes without any chemical damage.

Bibliography

Lee, Y. T., Choi, W. K., & Hwang, D. K. (2016). Chemical free device fabrication of two dimensional van der Waals materials based transistors by using one-off stamping. Applied Physics Letters, 108(25).

Authors 3
  1. Young Tack Lee (first)
  2. Won Kook Choi (additional)
  3. Do Kyung Hwang (additional)
References 23 Referenced 14
  1. 10.1126/science.1102896 / Science (2004)
  2. 10.1021/nl9039636 / Nano Lett. (2010)
  3. 10.1039/c2nr30994g / Nanoscale (2012)
  4. 10.1063/1.4880732 / Appl. Phys. Lett. (2014)
  5. 10.1021/acsnano.5b04258 / ACS Nano (2015)
  6. 10.1021/nl204481s / Nano Lett. (2012)
  7. 10.1021/nn203715c / ACS Nano (2011)
  8. 10.1038/nnano.2010.279 / Nat. Nanotechnol. (2011)
  9. 10.1038/nmat3633 / Nat. Mater. (2013)
  10. 10.1002/smll.201303908 / Small (2014)
  11. 10.1021/nl301702r / Nano Lett. (2012)
  12. 10.1063/1.4820408 / Appl. Phys. Lett. (2013)
  13. 10.1021/nn501723y / ACS Nano (2014)
  14. 10.1021/nn405719x / ACS Nano (2014)
  15. 10.1038/nnano.2013.30 / Nat. Nanotechnol. (2013)
  16. 10.1038/nnano.2013.31 / Nat. Nanotechnol. (2013)
  17. See supplementary material at http://dx.doi.org/10.1063/1.4954223 for preparation process of one-off imprinting method (Fig. S1), OM images of h-BN transferring process (Fig. S2), electrical properties of MoS2 FET without h-BN passivation layer (Fig. S3), and with h-BN passivation layer (Fig. S4) and OM images of one-off imprinting process (Fig. S5).
  18. 10.1039/C4TC02961E / J. Mater. Chem. C (2015)
  19. 10.1063/1.4848235 / Appl. Phys. Lett. (2013)
  20. 10.1109/LED.2015.2481388 / IEEE Electron Device Lett. (2015)
  21. 10.1021/nl202239c / Nano Lett. (2011)
  22. 10.1039/C5NR00253B / Nanoscales (2015)
  23. 10.1039/C4NR06707J / Nanoscales (2015)
Dates
Type When
Created 9 years, 2 months ago (June 21, 2016, 5:24 p.m.)
Deposited 2 years, 2 months ago (June 17, 2023, 1:29 p.m.)
Indexed 1 month ago (July 30, 2025, 7:06 a.m.)
Issued 9 years, 2 months ago (June 20, 2016)
Published 9 years, 2 months ago (June 20, 2016)
Published Online 9 years, 2 months ago (June 20, 2016)
Published Print 9 years, 2 months ago (June 20, 2016)
Funders 1
  1. Korea Institute of Science and Technology 10.13039/501100003693

    Region: Asia

    gov (Local government)

    Labels1
    1. KIST
    Awards2
    1. 2E26420
    2. 2E26390

@article{Lee_2016, title={Chemical free device fabrication of two dimensional van der Waals materials based transistors by using one-off stamping}, volume={108}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4954223}, DOI={10.1063/1.4954223}, number={25}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Lee, Young Tack and Choi, Won Kook and Hwang, Do Kyung}, year={2016}, month=jun }