Abstract
We report on a chemical free one-off imprinting method to fabricate two dimensional (2D) van der Waals (vdWs) materials based transistors. Such one-off imprinting technique is the simplest and effective way to prevent unintentional chemical reaction or damage of 2D vdWs active channel during device fabrication process. 2D MoS2 nanosheets based transistors with a hexagonal-boron-nitride (h-BN) passivation layer, prepared by one-off imprinting, show negligible variations of transfer characteristics after chemical vapor deposition process. In addition, this method enables the fabrication of all 2D MoS2 transistors consisting of h-BN gate insulator, and graphene source/drain and gate electrodes without any chemical damage.
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Dates
Type | When |
---|---|
Created | 9 years, 2 months ago (June 21, 2016, 5:24 p.m.) |
Deposited | 2 years, 2 months ago (June 17, 2023, 1:29 p.m.) |
Indexed | 1 month ago (July 30, 2025, 7:06 a.m.) |
Issued | 9 years, 2 months ago (June 20, 2016) |
Published | 9 years, 2 months ago (June 20, 2016) |
Published Online | 9 years, 2 months ago (June 20, 2016) |
Published Print | 9 years, 2 months ago (June 20, 2016) |
Funders
1
Korea Institute of Science and Technology
10.13039/501100003693
Region: Asia
gov (Local government)
Labels
1
- KIST
Awards
2
- 2E26420
- 2E26390
@article{Lee_2016, title={Chemical free device fabrication of two dimensional van der Waals materials based transistors by using one-off stamping}, volume={108}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4954223}, DOI={10.1063/1.4954223}, number={25}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Lee, Young Tack and Choi, Won Kook and Hwang, Do Kyung}, year={2016}, month=jun }