Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We report the growth of (001)-oriented VO2 films as thin as 1.5 nm with abrupt and reproducible metal-insulator transitions (MIT) without a capping layer. Limitations to the growth of thinner films with sharp MITs are discussed, including the Volmer-Weber type growth mode due to the high energy of the (001) VO2 surface. Another key limitation is interdiffusion with the (001) TiO2 substrate, which we quantify using low angle annular dark field scanning transmission electron microscopy in conjunction with electron energy loss spectroscopy. We find that controlling island coalescence on the (001) surface and minimization of cation interdiffusion by using a low growth temperature followed by a brief anneal at higher temperature are crucial for realizing ultrathin VO2 films with abrupt MIT behavior.

Bibliography

Paik, H., Moyer, J. A., Spila, T., Tashman, J. W., Mundy, J. A., Freeman, E., Shukla, N., Lapano, J. M., Engel-Herbert, R., Zander, W., Schubert, J., Muller, D. A., Datta, S., Schiffer, P., & Schlom, D. G. (2015). Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy. Applied Physics Letters, 107(16).

Authors 15
  1. Hanjong Paik (first)
  2. Jarrett A. Moyer (additional)
  3. Timothy Spila (additional)
  4. Joshua W. Tashman (additional)
  5. Julia A. Mundy (additional)
  6. Eugene Freeman (additional)
  7. Nikhil Shukla (additional)
  8. Jason M. Lapano (additional)
  9. Roman Engel-Herbert (additional)
  10. Willi Zander (additional)
  11. Jürgen Schubert (additional)
  12. David A. Muller (additional)
  13. Suman Datta (additional)
  14. Peter Schiffer (additional)
  15. Darrell G. Schlom (additional)
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  27. See supplementary material at http://dx.doi.org/10.1063/1.4932123 for additional characterization of the TiO2 substrates and VO2 films leading to the optimized film growth conditions reported in this Letter.
Dates
Type When
Created 9 years, 10 months ago (Oct. 20, 2015, 6:15 a.m.)
Deposited 2 years, 1 month ago (July 15, 2023, 9:47 p.m.)
Indexed 1 month ago (Aug. 6, 2025, 8:07 a.m.)
Issued 9 years, 10 months ago (Oct. 19, 2015)
Published 9 years, 10 months ago (Oct. 19, 2015)
Published Online 9 years, 10 months ago (Oct. 19, 2015)
Published Print 9 years, 10 months ago (Oct. 19, 2015)
Funders 2
  1. National Science Foundation 10.13039/100000001

    Region: Americas

    gov (National government)

    Labels4
    1. U.S. National Science Foundation
    2. NSF
    3. US NSF
    4. USA NSF
    Awards2
    1. DMR-1120296
    2. ECCS-0335765
  2. Office of Naval Research 10.13039/100000006

    Region: Americas

    gov (National government)

    Labels6
    1. U.S. Office of Naval Research
    2. Naval Research
    3. United States Office of Naval Research
    4. U.S. Department of the Navy Office of Naval Research
    5. The Office of Naval Research
    6. ONR
    Awards1
    1. N00014-11-1-0665

@article{Paik_2015, title={Transport properties of ultra-thin VO2 films on (001) TiO2 grown by reactive molecular-beam epitaxy}, volume={107}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4932123}, DOI={10.1063/1.4932123}, number={16}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Paik, Hanjong and Moyer, Jarrett A. and Spila, Timothy and Tashman, Joshua W. and Mundy, Julia A. and Freeman, Eugene and Shukla, Nikhil and Lapano, Jason M. and Engel-Herbert, Roman and Zander, Willi and Schubert, Jürgen and Muller, David A. and Datta, Suman and Schiffer, Peter and Schlom, Darrell G.}, year={2015}, month=oct }