Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We deposited a metal oxide buffer layer before atomic layer deposition (ALD) of Al2O3 onto exfoliated molybdenum disulfide (MoS2) in order to accomplish enhanced integration. We demonstrate that even at a high temperature, functionalization of MoS2 by means of a metal oxide buffer layer can effectively provide nucleation sites for ALD precursors, enabling much better surface coverage of Al2O3. It is shown that using a metal oxide buffer layer not only allows high temperature ALD process, resulting in highly improved quality of Al2O3/MoS2 interface, but also leaves MoS2 intact.

Bibliography

Son, S., Yu, S., Choi, M., Kim, D., & Choi, C. (2015). Improved high temperature integration of Al2O3 on MoS2 by using a metal oxide buffer layer. Applied Physics Letters, 106(2).

Authors 5
  1. Seokki Son (first)
  2. Sunmoon Yu (additional)
  3. Moonseok Choi (additional)
  4. Dohyung Kim (additional)
  5. Changhwan Choi (additional)
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Dates
Type When
Created 10 years, 7 months ago (Jan. 12, 2015, 2:44 p.m.)
Deposited 2 years, 2 months ago (June 17, 2023, 4:21 p.m.)
Indexed 3 weeks, 6 days ago (July 30, 2025, 7:04 a.m.)
Issued 10 years, 7 months ago (Jan. 12, 2015)
Published 10 years, 7 months ago (Jan. 12, 2015)
Published Online 10 years, 7 months ago (Jan. 12, 2015)
Published Print 10 years, 7 months ago (Jan. 12, 2015)
Funders 1
  1. IT R&D Program of MKE/KEIT
    Awards1
    1. 10039174

@article{Son_2015, title={Improved high temperature integration of Al2O3 on MoS2 by using a metal oxide buffer layer}, volume={106}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4905634}, DOI={10.1063/1.4905634}, number={2}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Son, Seokki and Yu, Sunmoon and Choi, Moonseok and Kim, Dohyung and Choi, Changhwan}, year={2015}, month=jan }