Abstract
We deposited a metal oxide buffer layer before atomic layer deposition (ALD) of Al2O3 onto exfoliated molybdenum disulfide (MoS2) in order to accomplish enhanced integration. We demonstrate that even at a high temperature, functionalization of MoS2 by means of a metal oxide buffer layer can effectively provide nucleation sites for ALD precursors, enabling much better surface coverage of Al2O3. It is shown that using a metal oxide buffer layer not only allows high temperature ALD process, resulting in highly improved quality of Al2O3/MoS2 interface, but also leaves MoS2 intact.
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Dates
Type | When |
---|---|
Created | 10 years, 7 months ago (Jan. 12, 2015, 2:44 p.m.) |
Deposited | 2 years, 2 months ago (June 17, 2023, 4:21 p.m.) |
Indexed | 3 weeks, 6 days ago (July 30, 2025, 7:04 a.m.) |
Issued | 10 years, 7 months ago (Jan. 12, 2015) |
Published | 10 years, 7 months ago (Jan. 12, 2015) |
Published Online | 10 years, 7 months ago (Jan. 12, 2015) |
Published Print | 10 years, 7 months ago (Jan. 12, 2015) |
@article{Son_2015, title={Improved high temperature integration of Al2O3 on MoS2 by using a metal oxide buffer layer}, volume={106}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4905634}, DOI={10.1063/1.4905634}, number={2}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Son, Seokki and Yu, Sunmoon and Choi, Moonseok and Kim, Dohyung and Choi, Changhwan}, year={2015}, month=jan }