DOI: 10.1063/1.4904848. Rapid thermal processing chamber for <i>in-situ</i> x-ray diffraction

Rapid thermal processing chamber for in-situ x-ray diffraction

10.1063/1.4904848

Crossref journal-article

AIP Publishing

Review of Scientific Instruments (317)

Abstract

Rapid thermal processing (RTP) is widely used for processing a variety of materials, including electronics and photovoltaics. Presently, optimization of RTP is done primarily based on ex-situ studies. As a consequence, the precise reaction pathways and phase progression during the RTP remain unclear. More awareness of the reaction pathways would better enable process optimization and foster increased adoption of RTP, which offers numerous advantages for synthesis of a broad range of materials systems. To achieve this, we have designed and developed a RTP instrument that enables real-time collection of X-ray diffraction data with intervals as short as 100 ms, while heating with ramp rates up to 100 °Cs−1, and with a maximum operating temperature of 1200 °C. The system is portable and can be installed on a synchrotron beamline. The unique capabilities of this instrument are demonstrated with in-situ characterization of a Bi2O3-SiO2 glass frit obtained during heating with ramp rates 5 °C s−1 and 100 °C s−1, revealing numerous phase changes.

Bibliography

Ahmad, Md. I., Van Campen, D. G., Fields, J. D., Yu, J., Pool, V. L., Parilla, P. A., Ginley, D. S., Van Hest, M. F. A. M., & Toney, M. F. (2015). Rapid thermal processing chamber for in-situ x-ray diffraction. Review of Scientific Instruments, 86(1).

Authors 9

Md. Imteyaz Ahmad (first)
Douglas G. Van Campen (additional)
Jeremy D. Fields (additional)
Jiafan Yu (additional)
Vanessa L. Pool (additional)
Philip A. Parilla (additional)
David S. Ginley (additional)
Maikel F. A. M. Van Hest (additional)
Michael F. Toney (additional)

References 19 Referenced 14

10.1016/j.solmat.2008.10.021 / Sol. Energy Mater. Sol. Cells (2009)
10.1002/adfm.200901305 / Adv. Funct. Mater. (2010)
10.1016/j.solmat.2006.03.040 / Sol. Energy Mater. Sol. Cells (2006)
10.1016/j.egypro.2012.07.104 / Energy Procedia (2002)
10.1088/0268-1242/3/5/001 / Semicond. Sci. Technol. (2008)
10.1557/PROC-525-351 / Mat. Res. Soc. Symp. Proc. (1998)
10.1016/0921-5093(94)90194-5 / Mat. Sci. Eng. A (1994)
10.1016/j.progsolidstchem.2004.02.001 / Prog. Solid State Chem. (2003)
{'first-page': '852', 'volume-title': 'Physical Metallurgy', 'year': '1983', 'key': '2023070415362921300_c9'} / Physical Metallurgy (1983)
10.1016/j.jcrysgro.2010.10.114 / J. Cryst. Growth (2011)
10.1557/PROC-470-17 / Mater. Res. Soc. Symp. Proc. (1997)
10.1557/JMR.1995.2355 / J. Mater. Res. (1995)
10.1002/aenm.201300339 / Adv. Eng. Mater. (2013)
10.1557/PROC-525-103 / Mater. Res. Soc. Symp. Proc. (1998)
{'key': '2023070415362921300_c15'}
10.1016/j.jallcom.2012.09.080 / J. Alloys Compd. (2013)
10.1111/jace.12135 / J. Am. Ceram. Soc. (2013)
10.2298/SOS1103353G / Sci. Sintering (2011)
10.1016/S0960-8974(00)00003-6 / Prog. Cryst. Growth Charact. (2000)

Dates

Type	When
Created	10 years, 7 months ago (Jan. 5, 2015, 1:30 p.m.)
Deposited	2 years, 1 month ago (July 4, 2023, 3:30 p.m.)
Indexed	1 month ago (July 30, 2025, 7:04 a.m.)
Issued	10 years, 7 months ago (Jan. 1, 2015)
Published	10 years, 7 months ago (Jan. 1, 2015)
Published Online	10 years, 7 months ago (Jan. 5, 2015)
Published Print	10 years, 7 months ago (Jan. 1, 2015)

Funders 1

U.S. Department of Energy 10.13039/100000015
Region: Americas
gov (National government)
Labels8
1. Energy Department
2. Department of Energy
3. United States Department of Energy
4. ENERGY.GOV
5. US Department of Energy
6. USDOE
7. DOE
8. USADOE
Awards2
1. DE-EE0005951
2. DE-AC02-76SF00515

BibTeX

@article{Ahmad_2015, title={Rapid thermal processing chamber for in-situ x-ray diffraction}, volume={86}, ISSN={1089-7623}, url={http://dx.doi.org/10.1063/1.4904848}, DOI={10.1063/1.4904848}, number={1}, journal={Review of Scientific Instruments}, publisher={AIP Publishing}, author={Ahmad, Md. Imteyaz and Van Campen, Douglas G. and Fields, Jeremy D. and Yu, Jiafan and Pool, Vanessa L. and Parilla, Philip A. and Ginley, David S. and Van Hest, Maikel F. A. M. and Toney, Michael F.}, year={2015}, month=jan }

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  "abstract": "<jats:p>Rapid thermal processing (RTP) is widely used for processing a variety of materials, including electronics and photovoltaics. Presently, optimization of RTP is done primarily based on ex-situ studies. As a consequence, the precise reaction pathways and phase progression during the RTP remain unclear. More awareness of the reaction pathways would better enable process optimization and foster increased adoption of RTP, which offers numerous advantages for synthesis of a broad range of materials systems. To achieve this, we have designed and developed a RTP instrument that enables real-time collection of X-ray diffraction data with intervals as short as 100 ms, while heating with ramp rates up to 100 \u00b0Cs\u22121, and with a maximum operating temperature of 1200 \u00b0C. The system is portable and can be installed on a synchrotron beamline. The unique capabilities of this instrument are demonstrated with in-situ characterization of a Bi2O3-SiO2 glass frit obtained during heating with ramp rates 5 \u00b0C s\u22121 and 100 \u00b0C s\u22121, revealing numerous phase changes.</jats:p>",
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