Abstract
We perform a structural analysis of nitrogen-doped graphene on SiC(0001) prepared by ultra low-energy ion bombardment. Using scanning tunneling microscopy, we show that nitrogen atoms are incorporated almost exclusively as graphitic substitution in the graphene honeycomb lattice. With an irradiation energy of 25 eV and a fluence of approximately 5 × 1014 cm−2, we achieve a nitrogen content of around 1%. By quantitatively comparing the position of the N-atoms in the topography measurements with simulated random distributions, we find statistically significant short-range correlations. Consequently, we are able to show that the dopants arrange preferably at lattice sites given by the 6 × 6-reconstruction of the underlying substrate. This selective incorporation is most likely triggered by adsorbate layers present during the ion bombardment. This study identifies low-energy ion irradiation as a promising method for controlled doping in epitaxial graphene.
References
33
Referenced
27
10.1126/science.1125925
/ Science (2006)10.1038/nmat2382
/ Nature Mater. (2009)10.1038/nmat1967
/ Nature Mater. (2007)10.1021/ja071658g
/ J. Am. Chem. Soc. (2007)10.1126/science.1208759
/ Science (2011)10.1021/nl401781d
/ Nano Lett. (2013)10.1021/nl2031037
/ Nano Lett. (2011)10.1021/ja408463g
/ J. Am. Chem. Soc. (2014)10.1021/cs200652y
/ ACS Catal. (2012)10.1021/cm102666r
/ Chem. Mater. (2011)10.1007/s12274-013-0317-7
/ Nano Res. (2013)10.1021/nn304315z
/ ACS Nano (2012)10.1063/1.4726281
/ Appl. Phys. Lett. (2012)10.1103/PhysRevB.85.161408
/ Phys. Rev. B (2012)10.1021/jp309964m
/ J. Phys. Chem. C (2013)10.1103/PhysRevB.83.115424
/ Phys. Rev. B (2011)10.1063/1.4816715
/ AIP Adv. (2013)10.1021/nl402812y
/ Nano Lett. (2013)10.1088/0022-3727/43/37/374009
/ J. Phys. D: Appl. Phys. (2010)-
See supplementary material at http://dx.doi.org/10.1063/1.4895801 for the simulation of the implantation process.
(
10.1063/1.4895801
) 10.1016/j.ssc.2006.07.042
/ Solid State Commun. (2006)10.1016/j.ssc.2010.11.033
/ Solid State Commun. (2011)10.1103/PhysRevB.77.235412
/ Phys. Rev. B (2008)10.1103/PhysRevB.81.155412
/ Phys. Rev. B (2010)10.1021/nn1002425
/ ACS Nano (2010)10.1103/PhysRevLett.97.215501
/ Phys. Rev. Lett. (2006)10.1021/nn204536e
/ ACS Nano (2012)10.3762/bjnano.2.42
/ Beilstein J. Nanotechnol. (2011)10.1021/ja902714h
/ J. Am. Chem. Soc. (2009)10.1103/PhysRevLett.108.156803
/ Phys. Rev. Lett. (2012)10.1021/nn300258b
/ ACS Nano (2012)10.1021/nn403988y
/ ACS Nano (2013)10.1103/PhysRevB.59.10296
/ Phys. Rev. B (1999)
Dates
Type | When |
---|---|
Created | 10 years, 11 months ago (Sept. 17, 2014, 8:30 p.m.) |
Deposited | 2 years, 2 months ago (June 24, 2023, 10:28 p.m.) |
Indexed | 1 month ago (July 30, 2025, 7:04 a.m.) |
Issued | 10 years, 11 months ago (Sept. 15, 2014) |
Published | 10 years, 11 months ago (Sept. 15, 2014) |
Published Online | 10 years, 11 months ago (Sept. 17, 2014) |
Published Print | 10 years, 11 months ago (Sept. 15, 2014) |
Funders
2
India office, University of Gottingen, Germany
Deutsche Forschungsgemeinschaft (DFG)
10.13039/501100001659
Deutsche ForschungsgemeinschaftRegion: Europe
gov (National government)
Labels
3
- German Research Association
- German Research Foundation
- DFG
Awards
2
- HO1125/21-1
- 1459
@article{Willke_2014, title={Short-range ordering of ion-implanted nitrogen atoms in SiC-graphene}, volume={105}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4895801}, DOI={10.1063/1.4895801}, number={11}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Willke, P. and Amani, J. A. and Thakur, S. and Weikert, S. and Druga, T. and Maiti, K. and Hofsäss, H. and Wenderoth, M.}, year={2014}, month=sep }