Abstract
We fabricate MoS2 field effect transistors on both SiO2 and polymethyl methacrylate (PMMA) dielectrics and measure charge carrier mobility in a four-probe configuration. For multilayer MoS2 on SiO2, the mobility is 30–60 cm2/Vs, relatively independent of thickness (15–90 nm), and most devices exhibit unipolar n-type behavior. In contrast, multilayer MoS2 on PMMA shows mobility increasing with thickness, up to 470 cm2/Vs (electrons) and 480 cm2/Vs (holes) at thickness ∼50 nm. The dependence of the mobility on thickness points to a long-range dielectric effect of the bulk MoS2 in increasing mobility.
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Dates
Type | When |
---|---|
Created | 12 years, 6 months ago (Jan. 29, 2013, 6:50 p.m.) |
Deposited | 2 years ago (Aug. 6, 2023, 12:49 a.m.) |
Indexed | 13 hours, 14 minutes ago (Aug. 21, 2025, 12:51 p.m.) |
Issued | 12 years, 6 months ago (Jan. 28, 2013) |
Published | 12 years, 6 months ago (Jan. 28, 2013) |
Published Online | 12 years, 6 months ago (Jan. 29, 2013) |
Published Print | 12 years, 6 months ago (Jan. 28, 2013) |
Funders
1
National Science Foundation
10.13039/100000001
Region: Americas
gov (National government)
Labels
4
- U.S. National Science Foundation
- NSF
- US NSF
- USA NSF
Awards
1
- DMR-11-05224
@article{Bao_2013, title={High mobility ambipolar MoS2 field-effect transistors: Substrate and dielectric effects}, volume={102}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.4789365}, DOI={10.1063/1.4789365}, number={4}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Bao, Wenzhong and Cai, Xinghan and Kim, Dohun and Sridhara, Karthik and Fuhrer, Michael S.}, year={2013}, month=jan }