Abstract
The density of 0.5–3 μm thick vapor-deposited films of water ice were measured by combined optical interferometry and microbalance techniques during deposition on an optically flat gold substrate from a capillary array gas source. The films were of high optical quality with an index of refraction of 1.29±0.01 at 435.8 nm, a density of 0.82±0.01 g/cm3, and a porosity of 0.13±0.01. In contrast to previous studies, none of the measured properties exhibited any significant variation with growth rate or temperature over the range studied (0.6–2 nm/min, 20–140 K).
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 8:16 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 7, 2024, 2:44 p.m.) |
Indexed | 4 weeks, 1 day ago (July 30, 2025, 11:18 a.m.) |
Issued | 27 years, 6 months ago (Feb. 22, 1998) |
Published | 27 years, 6 months ago (Feb. 22, 1998) |
Published Print | 27 years, 6 months ago (Feb. 22, 1998) |
@article{Westley_1998, title={Density and index of refraction of water ice films vapor deposited at low temperatures}, volume={108}, ISSN={1089-7690}, url={http://dx.doi.org/10.1063/1.475730}, DOI={10.1063/1.475730}, number={8}, journal={The Journal of Chemical Physics}, publisher={AIP Publishing}, author={Westley, M. S. and Baratta, G. A. and Baragiola, R. A.}, year={1998}, month=feb, pages={3321–3326} }