DOI: 10.1063/1.372511. Magnetization processes and magnetoresistance in Co/Cu multilayers as a function of the Cu layer thickness.

Magnetization processes and magnetoresistance in Co/Cu multilayers as a function of the Cu layer thickness.

10.1063/1.372511

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

We have studied Co(15 Å)/Cu(t) multilayers with nominal Cu spacer layer thicknesses of 7, 8, 9, and 10 Å. For multilayers with identical dimensions, transport measurements showed that the introduction of oxygen during growth increased the magnetoresistance while transmission electron microscopy revealed the effect of the oxygen bleed on the microstructure was reduced grain size, suppression of the Cohcp phase, and reduced texturing. Lorentz microscopy was used to determine the angle between magnetization vectors in adjacent magnetic layers and the values so deduced were found to correlate well with the variation of magnetoresistance within the multilayer sets.

Bibliography

Aitchison, P. R., Chapman, J. N., Holloway, H., Kubinski, D. J., & Parsons, M. (2000). Magnetization processes and magnetoresistance in Co/Cu multilayers as a function of the Cu layer thickness. Journal of Applied Physics, 87(9), 5753â5755.

Authors 5

P. R. Aitchison (first)
J. N. Chapman (additional)
H. Holloway (additional)
D. J. Kubinski (additional)
M. Parsons (additional)

References 6 Referenced 6

10.1002/pssa.2211250225 / Phys. Status Solidi A (1991)
{'key': '2024020516522101900_r2', 'first-page': '925', 'volume': '31', 'year': '1998', 'journal-title': 'J. Appl. Phys.'} / J. Appl. Phys. (1998)
10.1063/1.370935 / J. Appl. Phys. (1999)
10.1063/1.365620 / J. Appl. Phys. (1997)
10.1088/0022-3727/17/4/003 / J. Phys. D: Appl. Phys. (1984)
10.1063/1.358210 / J. Appl. Phys. (1994)

Dates

Type	When
Created	23 years ago (July 26, 2002, 9:55 a.m.)
Deposited	1 year, 6 months ago (Feb. 5, 2024, 12:22 p.m.)
Indexed	1 year, 6 months ago (Feb. 5, 2024, 12:40 p.m.)
Issued	25 years, 3 months ago (May 1, 2000)
Published	25 years, 3 months ago (May 1, 2000)
Published Print	25 years, 3 months ago (May 1, 2000)

Funders 0

None

BibTeX

@article{Aitchison_2000, title={Magnetization processes and magnetoresistance in Co/Cu multilayers as a function of the Cu layer thickness.}, volume={87}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.372511}, DOI={10.1063/1.372511}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Aitchison, P. R. and Chapman, J. N. and Holloway, H. and Kubinski, D. J. and Parsons, M.}, year={2000}, month=may, pages={5753–5755} }

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