Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Nanocluster carbon films grown using a cathodic arc process at room temperature in the presence of background gases such as He are found to be good electron emitters. The variation in the surface morphology and the corresponding emission characteristics of the films with change in helium partial pressure (5×10−4–50 Torr) during the film growth are reported. The effect of helium partial pressure on clustering was studied for films grown at nitrogen partial pressures of 10−4 and 10−3 Torr. The surface morphology of the films grown, varied from smooth through clusters (with sizes 50–200 nm), to fibrous films. The threshold field varied from 1 to 10 V/μm for an emission current density of 1 μA/cm2. These films exhibit an emission site density of ∼104–105/cm2 at an applied field of 5 V/μm.

Bibliography

Satyanarayana, B. S., Robertson, J., & Milne, W. I. (2000). Low threshold field emission from nanoclustered carbon grown by cathodic arc. Journal of Applied Physics, 87(6), 3126–3131.

Authors 3
  1. B. S. Satyanarayana (first)
  2. J. Robertson (additional)
  3. W. I. Milne (additional)
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:55 a.m.)
Deposited 1 year, 6 months ago (Feb. 10, 2024, 1:26 p.m.)
Indexed 1 year, 6 months ago (Feb. 10, 2024, 1:40 p.m.)
Issued 25 years, 5 months ago (March 15, 2000)
Published 25 years, 5 months ago (March 15, 2000)
Published Print 25 years, 5 months ago (March 15, 2000)
Funders 0

None

@article{Satyanarayana_2000, title={Low threshold field emission from nanoclustered carbon grown by cathodic arc}, volume={87}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.372309}, DOI={10.1063/1.372309}, number={6}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Satyanarayana, B. S. and Robertson, J. and Milne, W. I.}, year={2000}, month=mar, pages={3126–3131} }