DOI: 10.1063/1.372113. High permittivity thin film nanolaminates

High permittivity thin film nanolaminates

10.1063/1.372113

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Thin (∼10 nm) films comprising of Ta2O5–HfO2, Ta2O5–ZrO2, and ZrO2–HfO2 nanolaminates were deposited and characterized for possible gate dielectric applications. These films were deposited on silicon substrates using atomic layer deposition. The dielectric constants of these films were in 12–14 range and the leakage currents in 2.6×10−8–4.2×10−7 A/cm2 range at 1 MV/cm electric field. It was found that as these films were made thinner, the value of their dielectric constant dropped compared to their bulk values. The dominant leakage current mechanism at low electric fields was determined to be Schottky emission, whereas Poole–Frenkel emission dominated at higher fields.

Bibliography

Zhang, H., Solanki, R., Roberds, B., Bai, G., & Banerjee, I. (2000). High permittivity thin film nanolaminates. Journal of Applied Physics, 87(4), 1921â1924.

Authors 5

H. Zhang (first)
R. Solanki (additional)
B. Roberds (additional)
G. Bai (additional)
I. Banerjee (additional)

References 11 Referenced 92

10.1016/S0920-2307(89)80006-4 / Mater. Sci. Rep. (1989)
{'key': '2024021008135056100_r2'}
10.1149/1.2221612 / J. Electrochem. Soc. (1993)
{'key': '2024021008135056100_r4'}
10.1149/1.2054904 / J. Electrochem. Soc. (1994)
10.1063/1.120569 / Appl. Phys. Lett. (1998)
10.1063/1.121930 / Appl. Phys. Lett. (1998)
10.1149/1.1837399 / J. Electrochem. Soc. (1997)
10.1063/1.115990 / Appl. Phys. Lett. (1996)
{'key': '2024021008135056100_r10', 'first-page': '511', 'volume': '284', 'year': '1993', 'journal-title': 'Mater. Res. Soc. Symp. Proc.'} / Mater. Res. Soc. Symp. Proc. (1993)
10.1063/1.365252 / J. Appl. Phys. (1997)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:55 a.m.)
Deposited	1 year, 6 months ago (Feb. 10, 2024, 5:01 a.m.)
Indexed	2 months, 1 week ago (June 24, 2025, 8:45 a.m.)
Issued	25 years, 6 months ago (Feb. 15, 2000)
Published	25 years, 6 months ago (Feb. 15, 2000)
Published Print	25 years, 6 months ago (Feb. 15, 2000)

Funders 0

None

BibTeX

@article{Zhang_2000, title={High permittivity thin film nanolaminates}, volume={87}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.372113}, DOI={10.1063/1.372113}, number={4}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zhang, H. and Solanki, R. and Roberds, B. and Bai, G. and Banerjee, I.}, year={2000}, month=feb, pages={1921–1924} }

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