DOI: 10.1063/1.368100. Effects of hydrogen plasma treatment on the 1.54 μm luminescence of erbium-doped porous silicon

Effects of hydrogen plasma treatment on the 1.54 μm luminescence of erbium-doped porous silicon

10.1063/1.368100

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Well resolved, sharp photoluminescence (PL) peaks of Er3+ (4f11) ions at ∼1.54 μm are obtained from Er-doped porous silicon (PS:Er) on which a hydrogen plasma treatment is carried out after electrochemical incorporation of Er3+ions into porous silicon. The full width at half maximum (FWHM) of the 1.538 μm main peak at 20 K is less than 1 nm, which is much smaller than that obtained from PS:Er samples annealed in a H2 or O2 flow (FWHM 7–10 nm), and is comparable to that of Er-doped crystalline silicon. The thermal quenching of the PL intensity is, however, relatively small, the PL intensity decreasing only by a factor of 10 from 20 to 300 K.

Bibliography

Dejima, T., Saito, R., Yugo, S., Isshiki, H., & Kimura, T. (1998). Effects of hydrogen plasma treatment on the 1.54 Î¼m luminescence of erbium-doped porous silicon. Journal of Applied Physics, 84(2), 1036â1040.

Authors 5

Tohru Dejima (first)
Riichiro Saito (additional)
Shigemi Yugo (additional)
Hideo Isshiki (additional)
Tadamasa Kimura (additional)

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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:54 a.m.)
Deposited	1 year, 6 months ago (Feb. 10, 2024, 10:51 p.m.)
Indexed	1 year, 6 months ago (Feb. 10, 2024, 11:10 p.m.)
Issued	27 years, 1 month ago (July 15, 1998)
Published	27 years, 1 month ago (July 15, 1998)
Published Print	27 years, 1 month ago (July 15, 1998)

Funders 0

None

BibTeX

@article{Dejima_1998, title={Effects of hydrogen plasma treatment on the 1.54 μm luminescence of erbium-doped porous silicon}, volume={84}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.368100}, DOI={10.1063/1.368100}, number={2}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Dejima, Tohru and Saito, Riichiro and Yugo, Shigemi and Isshiki, Hideo and Kimura, Tadamasa}, year={1998}, month=jul, pages={1036–1040} }

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