Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Using an ensemble Monte Carlo simulation, we study the electron transport properties in tensile strained Si grown on a Si1−xGex substrate and in an n-channel Si/Si1−xGex modulation-doped field-effect transistor (MODFET). Owing to the strain-induced modification of the conduction-band structure, the in-plane drift mobility in undoped material reaches 3250 cm2/V s at 300 K (for x⩾0.2) and 31000 cm2/V s at 77 K (for x⩾0.05). The two-dimensional Monte Carlo modeling of 0.18 μm gate Si/SiGe MODFETs reveals a high velocity overshoot of 2.5×107 cm/s related to a significant ballistic transport through the gated part of the strained Si channel. For a 0.18 μm gate and a Ge mole fraction x=0.3, intrinsic transconductance and transition frequency as high as 460 mS/mm and 85 GHz are obtained.

Bibliography

Dollfus, P. (1997). Si/Si 1−x Ge x heterostructures: Electron transport and field-effect transistor operation using Monte Carlo simulation. Journal of Applied Physics, 82(8), 3911–3916.

Authors 1
  1. Philippe Dollfus (first)
References 22 Referenced 66
  1. 10.1103/PhysRevLett.54.2441 / Phys. Rev. Lett. (1985)
  2. 10.1016/0169-4332(96)00049-9 / Appl. Surf. Sci. (1996)
  3. 10.1063/1.109949 / Appl. Phys. Lett. (1993)
  4. 10.1049/el:19920100 / Electron. Lett. (1992)
  5. {'key': '2024020219401763700_r5', 'first-page': '348', 'volume': 'ED-14', 'year': '1993', 'journal-title': 'IEEE Electron Device Lett.'} / IEEE Electron Device Lett. (1993)
  6. 10.1109/JQE.1986.1073152 / IEEE J. Quantum Electron. (1986)
  7. 10.1063/1.107684 / Appl. Phys. Lett. (1992)
  8. 10.1103/PhysRevB.12.2265 / Phys. Rev. B (1975)
  9. 10.1103/RevModPhys.55.645 / Rev. Mod. Phys. (1983)
  10. 10.1063/1.332737 / J. Appl. Phys. (1983)
  11. 10.1103/PhysRevB.38.9721 / Phys. Rev. B (1988)
  12. 10.1002/pssb.19700370106 / Phys. Status Solidi (1970)
  13. 10.1103/PhysRevB.14.1605 / Phys. Rev. B (1976)
  14. {'key': '2024020219401763700_r14', 'first-page': '1513', 'volume': 'ED-41', 'year': '1994', 'journal-title': 'IEEE Trans. Electron Devices'} / IEEE Trans. Electron Devices (1994)
  15. {'key': '2024020219401763700_r15'}
  16. 10.1002/pssb.2221030102 / Phys. Status Solidi B (1981)
  17. 10.1103/PhysRevB.18.5657 / Phys. Rev. B (1978)
  18. {'key': '2024020219401763700_r18', 'first-page': '12', 'volume': '41', 'year': '1990', 'journal-title': 'Phys. Rev. B'} / Phys. Rev. B (1990)
  19. 10.1103/PhysRevB.13.5347 / Phys. Rev. B (1976)
  20. {'key': '2024020219401763700_r20', 'first-page': '2129', 'volume': 'ED-36', 'year': '1989', 'journal-title': 'IEEE Trans. Electron Devices'} / IEEE Trans. Electron Devices (1989)
  21. {'key': '2024020219401763700_r21', 'first-page': '1365', 'volume': '133', 'year': '1994', 'journal-title': 'Jpn. J. Appl. Phys.'} / Jpn. J. Appl. Phys. (1994)
  22. 10.1063/1.363052 / J. Appl. Phys. (1996)
Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:33 a.m.)
Deposited 1 year, 6 months ago (Feb. 2, 2024, 3:28 p.m.)
Indexed 2 months, 1 week ago (June 24, 2025, 7:43 a.m.)
Issued 27 years, 10 months ago (Oct. 15, 1997)
Published 27 years, 10 months ago (Oct. 15, 1997)
Published Print 27 years, 10 months ago (Oct. 15, 1997)
Funders 0

None

@article{Dollfus_1997, title={Si/Si 1−x Ge x heterostructures: Electron transport and field-effect transistor operation using Monte Carlo simulation}, volume={82}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.365696}, DOI={10.1063/1.365696}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Dollfus, Philippe}, year={1997}, month=oct, pages={3911–3916} }