DOI: 10.1063/1.365538. Fabrication of nanometer-sized magnetic structures using e-beam patterned deposition masks

Fabrication of nanometer-sized magnetic structures using e-beam patterned deposition masks

10.1063/1.365538

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

We report on the development of a novel technique designed to study dimensional effects in sputter-deposited magnetic materials and multilayer nanostructures without the need for post-deposition patterning. Wires with widths ranging from 40 to 1000 nm have been deposited on Si wafer substrates through a deposition mask fabricated by e-beam lithography. A bilevel resist masking scheme allows smooth, near vertical sidewall profiles, and the resulting structures can be exposed using a simple lift-off process. This process was used to fabricate test structures of Fe, Cu, and Co which were characterized by scanning electron microscopy, atomic force microscopy, and ac resistivity measurements from 3 to 300 K. While the wire structures are geometrically well defined, transport measurements reveal high crystalline defect densities which must be eliminated to fabricate low-dimensional magnetoresistive structures.

Bibliography

Park, Y. D., Caballero, J. A., Cabbibo, A., Childress, J. R., Hudspeth, H. D., Schultz, T. J., & Sharifi, F. (1997). Fabrication of nanometer-sized magnetic structures using e-beam patterned deposition masks. Journal of Applied Physics, 81(8), 4717â4719.

Authors 7

Y. D. Park (first)
J. A. Caballero (additional)
A. Cabbibo (additional)
J. R. Childress (additional)
H. D. Hudspeth (additional)
T. J. Schultz (additional)
F. Sharifi (additional)

References 12 Referenced 20

10.1063/1.361893 / J. Appl. Phys. (1996)
10.1063/1.362017 / J. Appl. Phys. (1996)
10.1063/1.362136 / J. Appl. Phys. (1996)
10.1063/1.362135 / J. Appl. Phys. (1996)
10.1063/1.113587 / Appl. Phys. Lett. (1995)
10.1063/1.89690 / Appl. Phys. Lett. (1977)
{'key': '2024020218442375300_r7'}
10.1063/1.362440 / J. Appl. Phys. (1996)
10.1103/PhysRevLett.76.668 / Phys. Rev. Lett. (1996)
10.1103/PhysRevLett.71.428 / Phys. Rev. Lett. (1993)
10.1016/0304-8853(95)00512-9 / J. Magn. Magn. Mater. (1995)
10.1063/1.358162 / J. Appl. Phys. (1994)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:52 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 2:48 p.m.)
Indexed	5 months, 1 week ago (March 22, 2025, 4:31 a.m.)
Issued	28 years, 4 months ago (April 15, 1997)
Published	28 years, 4 months ago (April 15, 1997)
Published Print	28 years, 4 months ago (April 15, 1997)

Funders 0

None

BibTeX

@article{Park_1997, title={Fabrication of nanometer-sized magnetic structures using e-beam patterned deposition masks}, volume={81}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.365538}, DOI={10.1063/1.365538}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Park, Y. D. and Caballero, J. A. and Cabbibo, A. and Childress, J. R. and Hudspeth, H. D. and Schultz, T. J. and Sharifi, F.}, year={1997}, month=apr, pages={4717–4719} }

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