DOI: 10.1063/1.363602. Thermal stability of hydrogen and sulfur atoms in <i>a</i>-SiS<i>x</i>:H films

Thermal stability of hydrogen and sulfur atoms in a-SiSx:H films

10.1063/1.363602

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

The thermal stability of hydrogen and sulfur atoms in a-SiSx:H films is studied using gas effusion spectra and electron spectroscopy for chemical analysis. Two evolution peaks of hydrogen are found above 400 °C in gas effusion spectra of a-SiSx:H films. Sulfur atoms are evolved only above 550 °C. The stability of sulfur and the relationship of dangling bonds to sulfur effusion are discussed.

Bibliography

Itoh, T., Nitta, S., Wang, S. L., & Taylor, P. C. (1996). Thermal stability of hydrogen and sulfur atoms in a-SiSx:H films. Journal of Applied Physics, 80(10), 6028â6031.

Authors 4

Takashi Itoh (first)
Shoji Nitta (additional)
S. L. Wang (additional)
P. C. Taylor (additional)

References 19 Referenced 5

10.1063/1.89674 / Appl. Phys. Lett. (1977)
10.1063/1.328084 / J. Appl. Phys. (1980)
10.1143/JJAP.19.L357 / Jpn. J. Appl. Phys. (1980)
10.1016/0038-1098(80)91204-1 / Solid State Commun. (1980)
{'key': '2024020217521486900_r4', 'first-page': '911', 'volume': '137&138', 'year': '1991', 'journal-title': 'J. Non-Cryst. Solids'} / J. Non-Cryst. Solids (1991)
10.1557/PROC-336-559 / Mater. Res. Soc. Symp. Proc. (1994)
10.1557/PROC-420-873 / MRS Symp. Proc. (1996)
10.1016/0038-1098(95)00284-7 / Solid State Commun. (1995)
{'key': '2024020217521486900_r8', 'first-page': '94', 'volume': '198–200', 'year': '1996', 'journal-title': 'J. Non-Cryst. Solids'} / J. Non-Cryst. Solids (1996)
{'key': '2024020217521486900_r9'}
{'key': '2024020217521486900_r10', 'first-page': '419', 'volume': '19', 'year': '1984', 'journal-title': 'Solid State Physics'} / Solid State Physics (1984)
10.1080/15363839408009543 / Fullerene Sci. Technol. (1994)
10.1063/1.330474 / J. Appl. Phys. (1982)
{'key': '2024020217521486900_r13'}
{'key': '2024020217521486900_r14'}
10.1016/0165-1633(91)90138-B / Sol. Energy Mater. (1991)
10.1016/0165-1633(82)90067-3 / Sol. Energy Mater. (1982)
{'key': '2024020217521486900_r17'}
10.1016/0038-1098(84)90048-6 / Solid State Commun. (1984)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:33 a.m.)
Deposited	1 year, 7 months ago (Feb. 2, 2024, 2:10 p.m.)
Indexed	1 year, 7 months ago (Feb. 2, 2024, 2:40 p.m.)
Issued	28 years, 9 months ago (Nov. 15, 1996)
Published	28 years, 9 months ago (Nov. 15, 1996)
Published Print	28 years, 9 months ago (Nov. 15, 1996)

Funders 0

None

BibTeX

@article{Itoh_1996, title={Thermal stability of hydrogen and sulfur atoms in a-SiSx:H films}, volume={80}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.363602}, DOI={10.1063/1.363602}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Itoh, Takashi and Nitta, Shoji and Wang, S. L. and Taylor, P. C.}, year={1996}, month=nov, pages={6028–6031} }

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