DOI: 10.1063/1.362887. Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition

Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition

10.1063/1.362887

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Zinc oxide (ZnO) films with c-axis orientation have been prepared on glass substrates by pulsed laser deposition with an ArF excimer laser. The fluctuations of c-axis orientation of the ZnO films are evaluated by full width at half-maximum (FWHM) of the rocking curve of the x-ray diffraction. The ZnO films with a FWHM of 1.9° can be obtained on the optimum conditions (substrate temperature of 500–600 °C, O2 gas pressure of 2–6×10−4 Torr) even at a thickness of 200 nm. We have observed the crystallization of the ZnO during film formation by using in situ reflection high energy electron diffraction. It is confirmed that ZnO thin films with a thickness of up to about 50 nm have c-axis orientation on the glass substrates.

Bibliography

Hayamizu, S., Tabata, H., Tanaka, H., & Kawai, T. (1996). Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition. Journal of Applied Physics, 80(2), 787â791.

Authors 4

Shunichi Hayamizu (first)
Hitoshi Tabata (additional)
Hidekazu Tanaka (additional)
Tomoji Kawai (additional)

References 14 Referenced 160

10.1109/PROC.1976.10210 / Proc. IEEE (1976)
10.1109/58.384442 / IEEE Trans. Ultrason. Ferroelectr. Freq. Control (1995)
10.1063/1.90393 / Appl. Phys. Lett. (1978)
10.1063/1.328100 / J. Appl. Phys. (1980)
10.1063/1.326391 / J. Appl. Phys. (1979)
10.1016/0039-6028(79)90406-0 / Surf. Sci. (1979)
10.1143/JJAP.31.3013 / Jpn. J. Appl. Phys. (1992)
10.1143/JJAP.34.L20 / Jpn. J. Appl. Phys. (1995)
10.1063/1.111120 / Appl. Phys. Lett. (1994)
10.1063/1.103155 / Appl. Phys. Lett. (1990)
10.1016/0022-0248(90)90393-Y / J. Cryst. Growth (1990)
{'key': '2024020217195883100_r12'}
{'key': '2024020217195883100_r13', 'first-page': '760', 'volume': '48', 'year': '1979', 'journal-title': 'Oyo Butsuri'} / Oyo Butsuri (1979)
10.1143/JJAP.18.673 / Jpn. J. Appl. Phys. (1979)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:50 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 1:39 p.m.)
Indexed	2 months ago (June 26, 2025, 8:46 a.m.)
Issued	29 years, 1 month ago (July 15, 1996)
Published	29 years, 1 month ago (July 15, 1996)
Published Print	29 years, 1 month ago (July 15, 1996)

Funders 0

None

BibTeX

@article{Hayamizu_1996, title={Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser deposition}, volume={80}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.362887}, DOI={10.1063/1.362887}, number={2}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Hayamizu, Shunichi and Tabata, Hitoshi and Tanaka, Hidekazu and Kawai, Tomoji}, year={1996}, month=jul, pages={787–791} }

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