DOI: 10.1063/1.362531. Adjustment of temperature coefficient of resistance in NiCr/CuNi(Mn)/NiCr films

Adjustment of temperature coefficient of resistance in NiCr/CuNi(Mn)/NiCr films

10.1063/1.362531

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

The thin-film system Ni0.37Cr0.63/Cu0.57Ni0.42Mn0.01/Ni0.37Cr0. 63 with a typical thickness of 1 μm is used for low-ohmic precision resistors. The necessary adjustment of the temperature coefficient of resistance (TCR) by annealing has been studied by investigating the irreversible changes of the resistance during various annealing steps of NiCr/CuNi(Mn)/NiCr multilayers in comparison with single layers of CuNi(Mn) and NiCr. Auger depth profiles showed that the interdiffusion of CuNi(Mn) and NiCr results in an impoverishment of Ni in CuNi(Mn), explaining the TCR shift by comparison with data of Cu1−xNix bulk material. The decrease of the resistivity and the reduction of the width of the copper-nickel conductive layer by formation of a Ni0.6Cr0.2Cu0.2 interdiffusion zone phase (in accordance with the Cu-Ni-Cr phase diagram) cause a significant curvature of the resistance-temperature curve. As main result, it is shown that the NiCr base and cover layers and their interdiffusion with CuNi(Mn) play the decisive role in adjusting the TCR. It was checked that oxidation and topography effects have no remarkable influences.

Bibliography

BrÃ¼ckner, W., Baunack, St., Elefant, D., & Reiss, G. (1996). Adjustment of temperature coefficient of resistance in NiCr/CuNi(Mn)/NiCr films. Journal of Applied Physics, 79(11), 8516â8520.

Authors 4

W. Brückner (first)
St. Baunack (additional)
D. Elefant (additional)
G. Reiss (additional)

References 14 Referenced 22

{'key': '2024020217121778300_r1'}
{'key': '2024020217121778300_r2'}
{'key': '2024020217121778300_r3', 'first-page': '18', 'volume': '6', 'year': '1985', 'journal-title': 'Int. J. Hybrid Microelectron.'} / Int. J. Hybrid Microelectron. (1985)
10.1016/0040-6090(94)06370-2 / Thin Solid Films (1995)
10.1016/0040-6090(94)06358-3 / Thin Solid Films (1995)
{'key': '2024020217121778300_r6', 'first-page': '17', 'volume': '19', 'year': '1989', 'journal-title': 'Microelectron. J.'} / Microelectron. J. (1989)
10.1016/0040-6090(84)90525-X / Thin Solid Films (1984)
10.1016/0001-6160(57)90099-8 / Acta Metallurgica (1957)
10.1016/0040-6090(86)90043-X / Thin Solid Films (1986)
10.1016/0042-207X(83)90527-4 / Vacuum (1983)
10.1002/pssa.2210730245 / Phys. Status Solidi A (1982)
10.1002/crat.19700050107 / Kristall und Technik (1970)
{'key': '2024020217121778300_r13'}
{'key': '2024020217121778300_r14', 'first-page': '263', 'volume': '25', 'year': '1936', 'journal-title': 'Annalen der Physik'} / Annalen der Physik (1936)

Dates

Type	When
Created	23 years ago (July 26, 2002, 9:50 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 1:23 p.m.)
Indexed	1 year, 6 months ago (Feb. 10, 2024, 10:58 p.m.)
Issued	29 years, 2 months ago (June 1, 1996)
Published	29 years, 2 months ago (June 1, 1996)
Published Print	29 years, 2 months ago (June 1, 1996)

Funders 0

None

BibTeX

@article{Br_ckner_1996, title={Adjustment of temperature coefficient of resistance in NiCr/CuNi(Mn)/NiCr films}, volume={79}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.362531}, DOI={10.1063/1.362531}, number={11}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Brückner, W. and Baunack, St. and Elefant, D. and Reiss, G.}, year={1996}, month=jun, pages={8516–8520} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        2,
        11
      ]
    ],
    "date-time": "2024-02-11T03:58:20Z",
    "timestamp": 1707623900249
  },
  "reference-count": 14,
  "publisher": "AIP Publishing",
  "issue": "11",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        1996,
        6,
        1
      ]
    ]
  },
  "abstract": "<jats:p>The thin-film system Ni0.37Cr0.63/Cu0.57Ni0.42Mn0.01/Ni0.37Cr0. 63 with a typical thickness of 1 \u03bcm is used for low-ohmic precision resistors. The necessary adjustment of the temperature coefficient of resistance (TCR) by annealing has been studied by investigating the irreversible changes of the resistance during various annealing steps of NiCr/CuNi(Mn)/NiCr multilayers in comparison with single layers of CuNi(Mn) and NiCr. Auger depth profiles showed that the interdiffusion of CuNi(Mn) and NiCr results in an impoverishment of Ni in CuNi(Mn), explaining the TCR shift by comparison with data of Cu1\u2212xNix bulk material. The decrease of the resistivity and the reduction of the width of the copper-nickel conductive layer by formation of a Ni0.6Cr0.2Cu0.2 interdiffusion zone phase (in accordance with the Cu-Ni-Cr phase diagram) cause a significant curvature of the resistance-temperature curve. As main result, it is shown that the NiCr base and cover layers and their interdiffusion with CuNi(Mn) play the decisive role in adjusting the TCR. It was checked that oxidation and topography effects have no remarkable influences.</jats:p>",
  "DOI": "10.1063/1.362531",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        26
      ]
    ],
    "date-time": "2002-07-26T13:50:13Z",
    "timestamp": 1027691413000
  },
  "page": "8516-8520",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 22,
  "title": "Adjustment of temperature coefficient of resistance in NiCr/CuNi(Mn)/NiCr films",
  "prefix": "10.1063",
  "volume": "79",
  "author": [
    {
      "given": "W.",
      "family": "Br\u00fcckner",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Institut f\u00fcr Festk\u00f6rper- und Werkstofforschung Dresden e.V., D-01171 Dresden, Germany"
        }
      ]
    },
    {
      "given": "St.",
      "family": "Baunack",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Institut f\u00fcr Festk\u00f6rper- und Werkstofforschung Dresden e.V., D-01171 Dresden, Germany"
        }
      ]
    },
    {
      "given": "D.",
      "family": "Elefant",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Institut f\u00fcr Festk\u00f6rper- und Werkstofforschung Dresden e.V., D-01171 Dresden, Germany"
        }
      ]
    },
    {
      "given": "G.",
      "family": "Reiss",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Institut f\u00fcr Festk\u00f6rper- und Werkstofforschung Dresden e.V., D-01171 Dresden, Germany"
        }
      ]
    }
  ],
  "member": "317",
  "reference": [
    {
      "key": "2024020217121778300_r1"
    },
    {
      "key": "2024020217121778300_r2"
    },
    {
      "key": "2024020217121778300_r3",
      "first-page": "18",
      "volume": "6",
      "year": "1985",
      "journal-title": "Int. J. Hybrid Microelectron."
    },
    {
      "key": "2024020217121778300_r4",
      "doi-asserted-by": "crossref",
      "first-page": "236",
      "DOI": "10.1016/0040-6090(94)06370-2",
      "volume": "258",
      "year": "1995",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020217121778300_r5",
      "doi-asserted-by": "crossref",
      "first-page": "252",
      "DOI": "10.1016/0040-6090(94)06358-3",
      "volume": "258",
      "year": "1995",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020217121778300_r6",
      "first-page": "17",
      "volume": "19",
      "year": "1989",
      "journal-title": "Microelectron. J."
    },
    {
      "key": "2024020217121778300_r7",
      "doi-asserted-by": "crossref",
      "first-page": "61",
      "DOI": "10.1016/0040-6090(84)90525-X",
      "volume": "121",
      "year": "1984",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020217121778300_r8",
      "doi-asserted-by": "crossref",
      "first-page": "257",
      "DOI": "10.1016/0001-6160(57)90099-8",
      "volume": "5",
      "year": "1957",
      "journal-title": "Acta Metallurgica"
    },
    {
      "key": "2024020217121778300_r9",
      "doi-asserted-by": "crossref",
      "first-page": "15",
      "DOI": "10.1016/0040-6090(86)90043-X",
      "volume": "139",
      "year": "1986",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020217121778300_r10",
      "doi-asserted-by": "crossref",
      "first-page": "49",
      "DOI": "10.1016/0042-207X(83)90527-4",
      "volume": "33",
      "year": "1983",
      "journal-title": "Vacuum"
    },
    {
      "key": "2024020217121778300_r11",
      "doi-asserted-by": "crossref",
      "first-page": "K153",
      "DOI": "10.1002/pssa.2210730245",
      "volume": "73",
      "year": "1982",
      "journal-title": "Phys. Status Solidi A"
    },
    {
      "key": "2024020217121778300_r12",
      "doi-asserted-by": "crossref",
      "first-page": "95",
      "DOI": "10.1002/crat.19700050107",
      "volume": "5",
      "year": "1970",
      "journal-title": "Kristall und Technik"
    },
    {
      "key": "2024020217121778300_r13"
    },
    {
      "key": "2024020217121778300_r14",
      "first-page": "263",
      "volume": "25",
      "year": "1936",
      "journal-title": "Annalen der Physik"
    }
  ],
  "container-title": "Journal of Applied Physics",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/79/11/8516/18686033/8516_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/79/11/8516/18686033/8516_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2024,
        2,
        2
      ]
    ],
    "date-time": "2024-02-02T18:23:54Z",
    "timestamp": 1706898234000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/jap/article/79/11/8516/490858/Adjustment-of-temperature-coefficient-of"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1996,
        6,
        1
      ]
    ]
  },
  "references-count": 14,
  "journal-issue": {
    "issue": "11",
    "published-print": {
      "date-parts": [
        [
          1996,
          6,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1063/1.362531",
  "relation": {},
  "ISSN": [
    "0021-8979",
    "1089-7550"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        1996,
        6,
        1
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        1996,
        6,
        1
      ]
    ]
  }
}