Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Specific contact resistances measured at elevated temperatures for Ni ohmic contacts to 6H-SiC were reported. The specific contact resistances were measured with the linear transmission line method at both room temperature and at 500 °C and yielded values <5×10−6 Ω cm2 at both temperatures. The trend shows a decreasing contact resistance at higher temperatures. The annealed metal film is a nickel silicide with substantial mixing of C throughout the silicide layer.

Bibliography

Crofton, J., McMullin, P. G., Williams, J. R., & Bozack, M. J. (1995). High-temperature ohmic contact to n-type 6H-SiC using nickel. Journal of Applied Physics, 77(3), 1317–1319.

Authors 4
  1. J. Crofton (first)
  2. P. G. McMullin (additional)
  3. J. R. Williams (additional)
  4. M. J. Bozack (additional)
References 6 Referenced 179
  1. {'key': '2024020214184961300_r1'}
  2. 10.1016/0038-1101(72)90048-2 / Solid-State Electron. (1972)
  3. {'key': '2024020214184961300_r3'}
  4. 10.1016/0168-583X(85)90762-1 / Nucl. Instrum. Methods B (1985)
  5. 10.1063/1.329018 / J. Appl. Phys. (1981)
  6. 10.1116/1.570618 / J. Vac. Sci. Technol. (1980)
Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:48 a.m.)
Deposited 1 year, 6 months ago (Feb. 2, 2024, 9:57 a.m.)
Indexed 2 weeks, 2 days ago (Aug. 12, 2025, 5:53 p.m.)
Issued 30 years, 6 months ago (Feb. 1, 1995)
Published 30 years, 6 months ago (Feb. 1, 1995)
Published Print 30 years, 6 months ago (Feb. 1, 1995)
Funders 0

None

@article{Crofton_1995, title={High-temperature ohmic contact to n-type 6H-SiC using nickel}, volume={77}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.358936}, DOI={10.1063/1.358936}, number={3}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Crofton, J. and McMullin, P. G. and Williams, J. R. and Bozack, M. J.}, year={1995}, month=feb, pages={1317–1319} }