Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

Experimental and theoretical studies are presented of the current-voltage characteristics of symmetrically doped n-type GaN-AlN-GaN semiconductor-insulator-semiconductor (SIS) structures. The asymmetry caused by the strain-induced electric field leads to the depletion layer barrier in addition to the barrier presented by a thin insulating layer of AlN. It is shown that the tunnel current depends on the degree of the elastic strain relaxation which, in turn, is related to the AlN film thickness. This dependence provides quantitative information about the film relaxation. This characterization technique is compared with the capacitance-voltage characterization of the SIS structures. The data indicate that the low bound of the conduction-band offset for the AlN/GaN heterointerface is close to 1 eV.

Bibliography

Bykhovski, A., Gelmont, B., Shur, M., & Khan, A. (1995). Current-voltage characteristics of strained piezoelectric structures. Journal of Applied Physics, 77(4), 1616–1620.

Authors 4
  1. A. Bykhovski (first)
  2. B. Gelmont (additional)
  3. M. Shur (additional)
  4. A. Khan (additional)
References 15 Referenced 86
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Dates
Type When
Created 23 years, 1 month ago (July 26, 2002, 9:48 a.m.)
Deposited 1 year, 6 months ago (Feb. 2, 2024, 10:02 a.m.)
Indexed 4 months, 3 weeks ago (April 1, 2025, 7:42 a.m.)
Issued 30 years, 6 months ago (Feb. 15, 1995)
Published 30 years, 6 months ago (Feb. 15, 1995)
Published Print 30 years, 6 months ago (Feb. 15, 1995)
Funders 0

None

@article{Bykhovski_1995, title={Current-voltage characteristics of strained piezoelectric structures}, volume={77}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.358916}, DOI={10.1063/1.358916}, number={4}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Bykhovski, A. and Gelmont, B. and Shur, M. and Khan, A.}, year={1995}, month=feb, pages={1616–1620} }