DOI: 10.1063/1.356508. A model for electrical conduction in metal-ferroelectric-metal thin-film capacitors

A model for electrical conduction in metal-ferroelectric-metal thin-film capacitors

10.1063/1.356508

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Time-zero current-voltage characteristics and time-dependent current behavior of metal-ferroelectric-metal (Pt-PZT-Pt) capacitor structures have been studied. Under constant-voltage stressing, the current density through the 1500-Å-thick lead-zirconate-titanate (PZT) film exhibits a power-law dependence on time, with the exponent (∼0.33) independent of temperature and voltage. Electrode material dependence of current density indicates that the conventional model of trap-limited single-carrier injection over nonblocking contacts is inadequate to explain the time-zero current. A change in top electrode material from Pt to In leads to the observation of work-function-driven Schottky contacts between the metal and ferroelectric. The current-voltage characteristics fit a two-carrier injection metal-semiconductor-metal model incorporating blocking contacts, with distinct low- and high-current regimes (PZT is assumed to be p-type and trap-free in this model). Temperature-dependent I-V measurements indicate a Pt-PZT barrier height of 0.6 eV and an acceptor doping level of ∼1018 cm−3 in PZT. The implications of this model on the optimization of ferroelectric capacitors for dynamic random access memory applications are discussed.

Bibliography

Sudhama, C., Campbell, A. C., Maniar, P. D., Jones, R. E., Moazzami, R., Mogab, C. J., & Lee, J. C. (1994). A model for electrical conduction in metal-ferroelectric-metal thin-film capacitors. Journal of Applied Physics, 75(2), 1014â1022.

Authors 7

C. Sudhama (first)
A. C. Campbell (additional)
P. D. Maniar (additional)
R. E. Jones (additional)
R. Moazzami (additional)
C. J. Mogab (additional)
J. C. Lee (additional)

References 36 Referenced 115

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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:15 a.m.)
Deposited	1 year, 6 months ago (Feb. 2, 2024, 7:38 a.m.)
Indexed	2 months ago (June 24, 2025, 7:28 a.m.)
Issued	31 years, 7 months ago (Jan. 15, 1994)
Published	31 years, 7 months ago (Jan. 15, 1994)
Published Print	31 years, 7 months ago (Jan. 15, 1994)

Funders 0

None

BibTeX

@article{Sudhama_1994, title={A model for electrical conduction in metal-ferroelectric-metal thin-film capacitors}, volume={75}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.356508}, DOI={10.1063/1.356508}, number={2}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Sudhama, C. and Campbell, A. C. and Maniar, P. D. and Jones, R. E. and Moazzami, R. and Mogab, C. J. and Lee, J. C.}, year={1994}, month=jan, pages={1014–1022} }

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