Abstract
Carbon acceptors in GaAs epitaxial layers grown from metalorganic sources are often partially passivated by hydrogen following growth. Here we examine heavily C-doped GaAs epilayers grown by metalorganic molecular beam epitaxy and metalorganic vapor phase epitaxy by infrared absorption, secondary ion mass spectrometry, and Hall measurements. The concentration of passivated C has been determined by calibrating the intensity of infrared absorption due to C-H complexes. We have investigated the sources of H in the layers and have found that H2 in the growth and annealing ambients is especially effective in passivating C. A brief anneal in an inert ambient at temperatures above 550 °C is sufficient to activate C acceptors that are passivated by H.
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Dates
| Type | When |
|---|---|
| Created | 23 years, 1 month ago (July 26, 2002, 9:46 a.m.) |
| Deposited | 1 year, 7 months ago (Feb. 4, 2024, 11:41 a.m.) |
| Indexed | 1 year, 6 months ago (Feb. 10, 2024, 7:40 p.m.) |
| Issued | 32 years, 4 months ago (April 15, 1993) |
| Published | 32 years, 4 months ago (April 15, 1993) |
| Published Print | 32 years, 4 months ago (April 15, 1993) |
@article{Kozuch_1993, title={Passivation of carbon-doped GaAs layers by hydrogen introduced by annealing and growth ambients}, volume={73}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.352902}, DOI={10.1063/1.352902}, number={8}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Kozuch, D. M. and Stavola, Michael and Pearton, S. J. and Abernathy, C. R. and Hobson, W. S.}, year={1993}, month=apr, pages={3716–3724} }