DOI: 10.1063/1.352060. Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes

Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes

10.1063/1.352060

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

We have fabricated boron carbide thin films on Si(111) and other substrates by plasma-enhanced chemical-vapor deposition (PECVD). The PECVD of boron carbides from nido-cage boranes, specially nido-pentaborane(9) (B5H9), and methane (CH4) is demonstrated. The band gap is closely correlated with the boron to carbon ratio and can range from 0.77 to 1.80 eV and is consistent with the thermal activation barrier of 1.25 eV for conductivity. We have made boron carbide by PECVD from pentaborane and methane that is sufficiently isotropic to obtain resistivities as large as 1010 Ω cm at room temperature. This material is also shown to be suitable for photoactive p-n heterojunction diode fabrication in combination with Si(111).

Bibliography

Lee, S., Mazurowski, J., Ramseyer, G., & Dowben, P. A. (1992). Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes. Journal of Applied Physics, 72(10), 4925â4933.

Authors 4

Sunwoo Lee (first)
John Mazurowski (additional)
G. Ramseyer (additional)
P. A. Dowben (additional)

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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:45 a.m.)
Deposited	1 year, 7 months ago (Feb. 4, 2024, 11:07 a.m.)
Indexed	2 days, 17 hours ago (Sept. 3, 2025, 5:51 a.m.)
Issued	32 years, 9 months ago (Nov. 15, 1992)
Published	32 years, 9 months ago (Nov. 15, 1992)
Published Print	32 years, 9 months ago (Nov. 15, 1992)

Funders 0

None

BibTeX

@article{Lee_1992, title={Characterization of boron carbide thin films fabricated by plasma enhanced chemical vapor deposition from boranes}, volume={72}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.352060}, DOI={10.1063/1.352060}, number={10}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Lee, Sunwoo and Mazurowski, John and Ramseyer, G. and Dowben, P. A.}, year={1992}, month=nov, pages={4925–4933} }

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