Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We have fabricated n-layer graphene field effect transistors on epitaxial ferroelectric Pb(Zr0.2Ti0.8)O3 (PZT) thin films. At low gate voltages, PZT behaves as a high-κ dielectric with κ up to 100. An unusual resistance hysteresis occurs in gate sweeps at high voltages, with its direction opposite to that expected from the polarization switching of PZT. The relaxation of the metastable state is thermally activated, with an activation barrier of 50–110 meV and a time constant of 6 h at 300 K. We attribute its origin to the slow dissociation/recombination dynamics of water molecules adsorbed at the graphene-PZT interface. This robust hysteresis can potentially be used to construct graphene-ferroelectric hybrid memory devices.

Bibliography

Hong, X., Hoffman, J., Posadas, A., Zou, K., Ahn, C. H., & Zhu, J. (2010). Unusual resistance hysteresis in n-layer graphene field effect transistors fabricated on ferroelectric Pb(Zr0.2Ti0.8)O3. Applied Physics Letters, 97(3).

Authors 6
  1. X. Hong (first)
  2. J. Hoffman (additional)
  3. A. Posadas (additional)
  4. K. Zou (additional)
  5. C. H. Ahn (additional)
  6. J. Zhu (additional)
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Dates
Type When
Created 15 years ago (July 23, 2010, 6:22 p.m.)
Deposited 2 years, 1 month ago (July 2, 2023, 9:57 p.m.)
Indexed 3 weeks, 1 day ago (July 30, 2025, 6:55 a.m.)
Issued 15 years, 1 month ago (July 19, 2010)
Published 15 years, 1 month ago (July 19, 2010)
Published Online 15 years ago (July 23, 2010)
Published Print 15 years, 1 month ago (July 19, 2010)
Funders 0

None

@article{Hong_2010, title={Unusual resistance hysteresis in n-layer graphene field effect transistors fabricated on ferroelectric Pb(Zr0.2Ti0.8)O3}, volume={97}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.3467450}, DOI={10.1063/1.3467450}, number={3}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Hong, X. and Hoffman, J. and Posadas, A. and Zou, K. and Ahn, C. H. and Zhu, J.}, year={2010}, month=jul }