DOI: 10.1063/1.345230. The properties of <i>a</i>-C:H films deposited by plasma decomposition of C2H2

The properties of a-C:H films deposited by plasma decomposition of C2H2

10.1063/1.345230

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Diamondlike a-C:H films have been deposited by plasma decomposition of C2 H2. 50 samples were prepared with a systematic variation of the deposition parameters: the substrate bias voltage was between −100 and −1400 V and the C2 H2 gas pressure was between 4×10−4 and 2.6×10−1 mbar. The following properties of the films were measured: the density by Rutherford backscattering, the total concentration of hydrogen by elastic recoil detection, the bonding ratio sp3 /sp2 by infrared spectroscopy, the internal stress by the bending beam method, and the hardness with a Knoop microhardness tester. It has been shown that the hardness and other mechanical properties cannot be correlated to the average carbon coordination number mc. This is because mc is calculated under the assumption of a homogenous single-phase model, which does not seem to be justified. It is demonstrated that the mechanical properties can be explained by the application of a void model.

Bibliography

Zou, J. W., Schmidt, K., Reichelt, K., & Dischler, B. (1990). The properties of a-C:H films deposited by plasma decomposition of C2H2. Journal of Applied Physics, 67(1), 487â494.

Authors 4

J. W. Zou (first)
K. Schmidt (additional)
K. Reichelt (additional)
B. Dischler (additional)

References 17 Referenced 129

10.1063/1.1660654 / J. Appl. Phys. (1971)
{'key': '2024020410364506300_r2', 'first-page': '305', 'volume': '1', 'year': '1983', 'journal-title': 'J. Vac. Sci. Technol. A'} / J. Vac. Sci. Technol. A (1983)
10.1016/0040-6090(80)90554-4 / Thin Solid Films (1980)
10.1063/1.332613 / J. Appl. Phys. (1983)
10.1016/0040-6090(81)90226-1 / Thin Solid Films (1981)
10.1063/1.343355 / J. Appl. Phys. (1989)
10.1116/1.575481 / J. Vac. Sci. Technol. A (1988)
10.1063/1.343833 / J. Appl. Phys. (1989)
10.1016/0168-583X(85)90762-1 / Nucl. Instrum. Methods B (1985)
10.1016/0038-1098(83)90957-2 / Sol. State Commun. (1983)
{'key': '2024020410364506300_r11'}
{'key': '2024020410364506300_r12'}
10.1116/1.575296 / J. Vac. Sci. Technol. A (1988)
10.1063/1.96027 / Appl. Phys. Lett. (1985)
{'key': '2024020410364506300_r15'}
10.1063/1.333135 / J. Appl. Phys. (1984)
10.1088/0022-3719/4/3/001 / J. Phys. C (1971)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 9:07 a.m.)
Deposited	1 year, 6 months ago (Feb. 4, 2024, 5:36 a.m.)
Indexed	3 weeks, 4 days ago (Aug. 2, 2025, 12:46 a.m.)
Issued	35 years, 7 months ago (Jan. 1, 1990)
Published	35 years, 7 months ago (Jan. 1, 1990)
Published Print	35 years, 7 months ago (Jan. 1, 1990)

Funders 0

None

BibTeX

@article{Zou_1990, title={The properties of a-C:H films deposited by plasma decomposition of C2H2}, volume={67}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.345230}, DOI={10.1063/1.345230}, number={1}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Zou, J. W. and Schmidt, K. and Reichelt, K. and Dischler, B.}, year={1990}, month=jan, pages={487–494} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        8,
        2
      ]
    ],
    "date-time": "2025-08-02T04:46:33Z",
    "timestamp": 1754109993674
  },
  "reference-count": 17,
  "publisher": "AIP Publishing",
  "issue": "1",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "abstract": "<jats:p>Diamondlike a-C:H films have been deposited by plasma decomposition of C2 H2. 50 samples were prepared with a systematic variation of the deposition parameters: the substrate bias voltage was between \u2212100 and \u22121400 V and the C2 H2 gas pressure was between 4\u00d710\u22124 and 2.6\u00d710\u22121 mbar. The following properties of the films were measured: the density by Rutherford backscattering, the total concentration of hydrogen by elastic recoil detection, the bonding ratio sp3 /sp2 by infrared spectroscopy, the internal stress by the bending beam method, and the hardness with a Knoop microhardness tester. It has been shown that the hardness and other mechanical properties cannot be correlated to the average carbon coordination number mc. This is because mc is calculated under the assumption of a homogenous single-phase model, which does not seem to be justified. It is demonstrated that the mechanical properties can be explained by the application of a void model.</jats:p>",
  "DOI": "10.1063/1.345230",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        26
      ]
    ],
    "date-time": "2002-07-26T13:07:39Z",
    "timestamp": 1027688859000
  },
  "page": "487-494",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 129,
  "title": "The properties of <i>a</i>-C:H films deposited by plasma decomposition of C2H2",
  "prefix": "10.1063",
  "volume": "67",
  "author": [
    {
      "given": "J. W.",
      "family": "Zou",
      "sequence": "first",
      "affiliation": [
        {
          "name": "KFA J\u00fclich, Institute f \u00fcr Schicht-und Ionentechnik, Postfach 1913, D-5170 J\u00fclich, Germany"
        }
      ]
    },
    {
      "given": "K.",
      "family": "Schmidt",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "KFA J\u00fclich, Institute f \u00fcr Schicht-und Ionentechnik, Postfach 1913, D-5170 J\u00fclich, Germany"
        }
      ]
    },
    {
      "given": "K.",
      "family": "Reichelt",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "KFA J\u00fclich, Institute f \u00fcr Schicht-und Ionentechnik, Postfach 1913, D-5170 J\u00fclich, Germany"
        }
      ]
    },
    {
      "given": "B.",
      "family": "Dischler",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "KFA J\u00fclich, Institute f \u00fcr Schicht-und Ionentechnik, Postfach 1913, D-5170 J\u00fclich, Germany"
        }
      ]
    }
  ],
  "member": "317",
  "reference": [
    {
      "key": "2024020410364506300_r1",
      "doi-asserted-by": "crossref",
      "first-page": "2953",
      "DOI": "10.1063/1.1660654",
      "volume": "42",
      "year": "1971",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2024020410364506300_r2",
      "first-page": "305",
      "volume": "1",
      "year": "1983",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2024020410364506300_r3",
      "doi-asserted-by": "crossref",
      "first-page": "19",
      "DOI": "10.1016/0040-6090(80)90554-4",
      "volume": "72",
      "year": "1980",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020410364506300_r4",
      "doi-asserted-by": "crossref",
      "first-page": "4590",
      "DOI": "10.1063/1.332613",
      "volume": "54",
      "year": "1983",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2024020410364506300_r5",
      "doi-asserted-by": "crossref",
      "first-page": "227",
      "DOI": "10.1016/0040-6090(81)90226-1",
      "volume": "80",
      "year": "1981",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "2024020410364506300_r6",
      "doi-asserted-by": "crossref",
      "first-page": "3914",
      "DOI": "10.1063/1.343355",
      "volume": "65",
      "year": "1989",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2024020410364506300_r7",
      "doi-asserted-by": "crossref",
      "first-page": "3103",
      "DOI": "10.1116/1.575481",
      "volume": "6",
      "year": "1988",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2024020410364506300_r8",
      "doi-asserted-by": "crossref",
      "first-page": "4729",
      "DOI": "10.1063/1.343833",
      "volume": "66",
      "year": "1989",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2024020410364506300_r9",
      "doi-asserted-by": "crossref",
      "first-page": "344",
      "DOI": "10.1016/0168-583X(85)90762-1",
      "volume": "9",
      "year": "1985",
      "journal-title": "Nucl. Instrum. Methods B"
    },
    {
      "key": "2024020410364506300_r10",
      "doi-asserted-by": "crossref",
      "first-page": "195",
      "DOI": "10.1016/0038-1098(83)90957-2",
      "volume": "48",
      "year": "1983",
      "journal-title": "Sol. State Commun."
    },
    {
      "key": "2024020410364506300_r11"
    },
    {
      "key": "2024020410364506300_r12"
    },
    {
      "key": "2024020410364506300_r13",
      "doi-asserted-by": "crossref",
      "first-page": "1778",
      "DOI": "10.1116/1.575296",
      "volume": "6",
      "year": "1988",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2024020410364506300_r14",
      "doi-asserted-by": "crossref",
      "first-page": "750",
      "DOI": "10.1063/1.96027",
      "volume": "47",
      "year": "1985",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "2024020410364506300_r15"
    },
    {
      "key": "2024020410364506300_r16",
      "doi-asserted-by": "crossref",
      "first-page": "764",
      "DOI": "10.1063/1.333135",
      "volume": "55",
      "year": "1984",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "2024020410364506300_r17",
      "doi-asserted-by": "crossref",
      "first-page": "257",
      "DOI": "10.1088/0022-3719/4/3/001",
      "volume": "4",
      "year": "1971",
      "journal-title": "J. Phys. C"
    }
  ],
  "container-title": "Journal of Applied Physics",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/67/1/487/18629804/487_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/67/1/487/18629804/487_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2024,
        2,
        4
      ]
    ],
    "date-time": "2024-02-04T10:36:56Z",
    "timestamp": 1707043016000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/jap/article/67/1/487/18419/The-properties-of-a-C-H-films-deposited-by-plasma"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "references-count": 17,
  "journal-issue": {
    "issue": "1",
    "published-print": {
      "date-parts": [
        [
          1990,
          1,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1063/1.345230",
  "relation": {},
  "ISSN": [
    "0021-8979",
    "1089-7550"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        1990,
        1,
        1
      ]
    ]
  }
}