Crossref journal-article
AIP Publishing
Applied Physics Letters (317)
Abstract

We have synthesized epitaxial NdNiO3 ultrathin films in a layer-by-layer growth mode under tensile and compressive strain on SrTiO3 (001) and LaAlO3 (001), respectively. A combination of x-ray diffraction, temperature dependent resistivity, and soft x-ray absorption spectroscopy has been applied to elucidate electronic and structural properties of the samples. In contrast to the bulk NdNiO3, the metal-insulator transition under compressive strain is found to be completely quenched, while the transition remains under the tensile strain albeit modified from the bulk behavior.

Bibliography

Liu, J., Kareev, M., Gray, B., Kim, J. W., Ryan, P., Dabrowski, B., Freeland, J. W., & Chakhalian, J. (2010). Strain-mediated metal-insulator transition in epitaxial ultrathin films of NdNiO3. Applied Physics Letters, 96(23).

Authors 8
  1. Jian Liu (first)
  2. M. Kareev (additional)
  3. B. Gray (additional)
  4. J. W. Kim (additional)
  5. P. Ryan (additional)
  6. B. Dabrowski (additional)
  7. J. W. Freeland (additional)
  8. J. Chakhalian (additional)
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Dates
Type When
Created 15 years, 2 months ago (June 9, 2010, 6:11 p.m.)
Deposited 2 years, 1 month ago (July 31, 2023, 5:04 a.m.)
Indexed 2 weeks ago (Aug. 21, 2025, 12:26 p.m.)
Issued 15 years, 2 months ago (June 7, 2010)
Published 15 years, 2 months ago (June 7, 2010)
Published Online 15 years, 2 months ago (June 9, 2010)
Published Print 15 years, 2 months ago (June 7, 2010)
Funders 0

None

@article{Liu_2010, title={Strain-mediated metal-insulator transition in epitaxial ultrathin films of NdNiO3}, volume={96}, ISSN={1077-3118}, url={http://dx.doi.org/10.1063/1.3451462}, DOI={10.1063/1.3451462}, number={23}, journal={Applied Physics Letters}, publisher={AIP Publishing}, author={Liu, Jian and Kareev, M. and Gray, B. and Kim, J. W. and Ryan, P. and Dabrowski, B. and Freeland, J. W. and Chakhalian, J.}, year={2010}, month=jun }