DOI: 10.1063/1.341381. A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+

A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+

10.1063/1.341381

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

We describe a new secondary ion mass spectrometry technique for compositional analysis of matrix elements. It consists of detecting the molecular ions CsM+ rather than M± ions (M is the matrix element to be analyzed) under Cs+ primary ion bombardment. The linear behavior of the CsM+ ion yield makes the analysis independent of the matrix effect. An application to in-depth quantitative compositional analysis for AlGaAs/GaAs multilayer structures is given. The compositions were determined with an absolute accuracy better than 2% and the depth resolution was smaller than 100 Å.

Bibliography

Gao, Y. (1988). A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+. Journal of Applied Physics, 64(7), 3760â3762.

Authors 1

Y. Gao (first)

References 8 Referenced 275

{'key': '2024020408341581000_r1'}
{'key': '2024020408341581000_r2'}
{'key': '2024020408341581000_r2a'}
{'key': '2024020408341581000_r3', 'first-page': '159', 'volume': '15', 'year': '1956', 'journal-title': 'Nucl. Instrum. Methods B'} / Nucl. Instrum. Methods B (1956)
{'key': '2024020408341581000_r4', 'first-page': '451', 'volume': '9', 'year': '1984', 'journal-title': 'J. Microsc. Spectrosc. Electron.'} / J. Microsc. Spectrosc. Electron. (1984)
10.1116/1.574966 / J. Vac. Sci. Technol. A (1988)
{'key': '2024020408341581000_r6', 'first-page': '974', 'volume': '14', 'year': '1977', 'journal-title': 'J. Vac. Sci. Technol.'} / J. Vac. Sci. Technol. (1977)
{'key': '2024020408341581000_r7'}

Dates

Type	When
Created	23 years ago (July 26, 2002, 9:02 a.m.)
Deposited	1 year, 6 months ago (Feb. 4, 2024, 3:34 a.m.)
Indexed	2 weeks, 3 days ago (Aug. 6, 2025, 8:57 a.m.)
Issued	36 years, 10 months ago (Oct. 1, 1988)
Published	36 years, 10 months ago (Oct. 1, 1988)
Published Print	36 years, 10 months ago (Oct. 1, 1988)

Funders 0

None

BibTeX

@article{Gao_1988, title={A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+}, volume={64}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.341381}, DOI={10.1063/1.341381}, number={7}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Gao, Y.}, year={1988}, month=oct, pages={3760–3762} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        8,
        6
      ]
    ],
    "date-time": "2025-08-06T12:57:37Z",
    "timestamp": 1754485057233
  },
  "reference-count": 8,
  "publisher": "AIP Publishing",
  "issue": "7",
  "content-domain": {
    "domain": [
      "pubs.aip.org"
    ],
    "crossmark-restriction": true
  },
  "published-print": {
    "date-parts": [
      [
        1988,
        10,
        1
      ]
    ]
  },
  "abstract": "<jats:p>We describe a new secondary ion mass spectrometry technique for compositional analysis of matrix elements. It consists of detecting the molecular ions CsM+ rather than M\u00b1 ions (M is the matrix element to be analyzed) under Cs+ primary ion bombardment. The linear behavior of the CsM+ ion yield makes the analysis independent of the matrix effect. An application to in-depth quantitative compositional analysis for AlGaAs/GaAs multilayer structures is given. The compositions were determined with an absolute accuracy better than 2% and the depth resolution was smaller than 100 \u00c5.</jats:p>",
  "DOI": "10.1063/1.341381",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        7,
        26
      ]
    ],
    "date-time": "2002-07-26T13:02:59Z",
    "timestamp": 1027688579000
  },
  "page": "3760-3762",
  "update-policy": "http://dx.doi.org/10.1063/aip-crossmark-policy-page",
  "source": "Crossref",
  "is-referenced-by-count": 275,
  "title": "A new secondary ion mass spectrometry technique for III-V semiconductor compounds using the molecular ions CsM+",
  "prefix": "10.1063",
  "volume": "64",
  "author": [
    {
      "given": "Y.",
      "family": "Gao",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Centre National d\u2019Etudes des T\u00e9l\u00e9communications, Laboratoire de Bagneux, 196 avenue Henri Ravera, 92220 Bagneux, France"
        }
      ]
    }
  ],
  "member": "317",
  "reference": [
    {
      "key": "2024020408341581000_r1"
    },
    {
      "key": "2024020408341581000_r2"
    },
    {
      "key": "2024020408341581000_r2a"
    },
    {
      "key": "2024020408341581000_r3",
      "first-page": "159",
      "volume": "15",
      "year": "1956",
      "journal-title": "Nucl. Instrum. Methods B"
    },
    {
      "key": "2024020408341581000_r4",
      "first-page": "451",
      "volume": "9",
      "year": "1984",
      "journal-title": "J. Microsc. Spectrosc. Electron."
    },
    {
      "key": "2024020408341581000_r5",
      "doi-asserted-by": "crossref",
      "first-page": "44",
      "DOI": "10.1116/1.574966",
      "volume": "6",
      "year": "1988",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "2024020408341581000_r6",
      "first-page": "974",
      "volume": "14",
      "year": "1977",
      "journal-title": "J. Vac. Sci. Technol."
    },
    {
      "key": "2024020408341581000_r7"
    }
  ],
  "container-title": "Journal of Applied Physics",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/64/7/3760/18619777/3760_1_online.pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://pubs.aip.org/aip/jap/article-pdf/64/7/3760/18619777/3760_1_online.pdf",
      "content-type": "unspecified",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2024,
        2,
        4
      ]
    ],
    "date-time": "2024-02-04T08:34:26Z",
    "timestamp": 1707035666000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://pubs.aip.org/jap/article/64/7/3760/15762/A-new-secondary-ion-mass-spectrometry-technique"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1988,
        10,
        1
      ]
    ]
  },
  "references-count": 8,
  "journal-issue": {
    "issue": "7",
    "published-print": {
      "date-parts": [
        [
          1988,
          10,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1063/1.341381",
  "relation": {},
  "ISSN": [
    "0021-8979",
    "1089-7550"
  ],
  "subject": [],
  "published-other": {
    "date-parts": [
      [
        1988,
        10,
        1
      ]
    ]
  },
  "published": {
    "date-parts": [
      [
        1988,
        10,
        1
      ]
    ]
  }
}