DOI: 10.1063/1.339055. Plasma source ion-implantation technique for surface modification of materials

Plasma source ion-implantation technique for surface modification of materials

10.1063/1.339055

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

Plasma source ion-implantation (PSII) is a new ion-implantation technique which has been optimized for surface modification of materials such as metals, plastics, and ceramics. PSII departs radically from conventional implantation technology by circumventing the line-of-sight restriction inherent in conventional ion implantation. In PSII, targets to be implanted are placed directly in a plasma source and then pulse biased to a high negative potential. A plasma sheath forms around the target and ions bombard the entire target simultaneously. Preliminary experiments have demonstrated that PSII: (1) efficiently implants ions to concentrations and depths required for surface modification, (2) produces material with improved microhardness and wear properties, and (3) dramatically improves the life of manufacturing tools in actual industrial applications. For example, the tool life of M-2 pierce punches used to produce holes in mild steel plate has been increased by a factor of 80.

Bibliography

Conrad, J. R., Radtke, J. L., Dodd, R. A., Worzala, F. J., & Tran, N. C. (1987). Plasma source ion-implantation technique for surface modification of materials. Journal of Applied Physics, 62(11), 4591â4596.

Authors 5

J. R. Conrad (first)
J. L. Radtke (additional)
R. A. Dodd (additional)
Frank J. Worzala (additional)
Ngoc C. Tran (additional)

References 32 Referenced 1,034

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{'key': '2024020407062835000_r13'}
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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 8:53 a.m.)
Deposited	1 year, 6 months ago (Feb. 4, 2024, 2:06 a.m.)
Indexed	1 week, 5 days ago (Aug. 22, 2025, 12:45 a.m.)
Issued	37 years, 9 months ago (Dec. 1, 1987)
Published	37 years, 9 months ago (Dec. 1, 1987)
Published Print	37 years, 9 months ago (Dec. 1, 1987)

Funders 0

None

BibTeX

@article{Conrad_1987, title={Plasma source ion-implantation technique for surface modification of materials}, volume={62}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.339055}, DOI={10.1063/1.339055}, number={11}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Conrad, J. R. and Radtke, J. L. and Dodd, R. A. and Worzala, Frank J. and Tran, Ngoc C.}, year={1987}, month=dec, pages={4591–4596} }

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