Abstract
Room-temperature optical absorption data in the 1.5–2.5-eV range are reported for indium nitride thin films prepared by reactive radio-frequency sputtering. The fundamental absorption edge in high-purity material is located at 1.89±0.01 eV and corresponds to a direct transition at k=0, in agreement with band-structure calculations. A significant Moss-Burstein shift is noted for carrier concentrations in excess of 1019 cm−3 and obeys the empirical relationship EG =1.89+2.1×10−8 n1/3 eV.
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Dates
Type | When |
---|---|
Created | 23 years, 1 month ago (July 26, 2002, 9:05 a.m.) |
Deposited | 1 year, 6 months ago (Feb. 5, 2024, 12:23 a.m.) |
Indexed | 6 days, 11 hours ago (Aug. 20, 2025, 8:41 a.m.) |
Issued | 39 years, 3 months ago (May 1, 1986) |
Published | 39 years, 3 months ago (May 1, 1986) |
Published Print | 39 years, 3 months ago (May 1, 1986) |
@article{Tansley_1986, title={Optical band gap of indium nitride}, volume={59}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.336906}, DOI={10.1063/1.336906}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Tansley, T. L. and Foley, C. P.}, year={1986}, month=may, pages={3241–3244} }