DOI: 10.1063/1.335732. Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation

Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation

10.1063/1.335732

Crossref journal-article

AIP Publishing

Journal of Applied Physics (317)

Abstract

The negative hydrogen ion formation process on a cesiated W(110) surface is studied by scattering a proton beam from such a surface. The primary energy ranges from 50 to 3000 eV. The angle of incidence with respect to the surface normal is 45° or 70°. A maximum negative-ion formation probability of 0.67 is measured. This quantity does not depend on the angle of incidence. However, it is strongly influenced by the time the surface has been exposed to the beam. This effect is attributed to hydrogen implantation.

Bibliography

van Amersfoort, P. W., Geerlings, J. J. C., Kwakman, L. F. Tz., Hershcovitch, A., Granneman, E. H. A., & Los, J. (1985). Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation. Journal of Applied Physics, 58(9), 3566â3572.

Authors 6

P. W. van Amersfoort (first)
J. J. C. Geerlings (additional)
L. F. Tz. Kwakman (additional)
A. Hershcovitch (additional)
E. H. A. Granneman (additional)
J. Los (additional)

References 30 Referenced 30

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{'key': '2024020504511832100_r6', 'first-page': '35', 'volume': '6', 'year': '1983', 'journal-title': 'Phys. Scr. T'} / Phys. Scr. T (1983)
10.1103/PhysRevB.25.4356 / Phys. Rev. B (1982)
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{'key': '2024020504511832100_r12'}
10.1063/1.1136475 / Rev. Sci. Instrum. (1981)
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10.1016/0039-6028(80)90259-9 / Surf. Sci. (1980)
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Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 8:53 a.m.)
Deposited	1 year, 7 months ago (Feb. 4, 2024, 11:51 p.m.)
Indexed	1 year, 4 months ago (April 18, 2024, 5:55 p.m.)
Issued	39 years, 10 months ago (Nov. 1, 1985)
Published	39 years, 10 months ago (Nov. 1, 1985)
Published Print	39 years, 10 months ago (Nov. 1, 1985)

Funders 0

None

BibTeX

@article{van_Amersfoort_1985, title={Formation of negative hydrogen ions on a cesiated W(110) surface; the influence of hydrogen implantation}, volume={58}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.335732}, DOI={10.1063/1.335732}, number={9}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={van Amersfoort, P. W. and Geerlings, J. J. C. and Kwakman, L. F. Tz. and Hershcovitch, A. and Granneman, E. H. A. and Los, J.}, year={1985}, month=nov, pages={3566–3572} }

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