Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

The electron velocity distribution is calculated for an idealized model of the high electron mobility transistor using a many-particle Monte Carlo model and a self-consistent two-dimensional Poisson solver. Hot electron effects, nonstationary effects, and real space transfer are analyzed. The results show that significant velocity overshoot, 2.8×107 cm/s at 300 K and 3.7×107 cm/s at 77 K exists under the gate and that the velocity overshoot is limited by both k-space transfer and real-space transfer. The values of the overshoot velocities are much smaller than those obtained from the more conventional drift-diffusion model.

Bibliography

Wang, T., & Hess, K. (1985). Calculation of the electron velocity distribution in high electron mobility transistors using an ensemble Monte Carlo method. Journal of Applied Physics, 57(12), 5336–5339.

Authors 2
  1. T. Wang (first)
  2. K. Hess (additional)
References 16 Referenced 68
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Dates
Type When
Created 23 years ago (July 26, 2002, 8:51 a.m.)
Deposited 1 year, 6 months ago (Feb. 4, 2024, 11:26 p.m.)
Indexed 1 year, 6 months ago (Feb. 10, 2024, 10:58 p.m.)
Issued 40 years, 2 months ago (June 15, 1985)
Published 40 years, 2 months ago (June 15, 1985)
Published Print 40 years, 2 months ago (June 15, 1985)
Funders 0

None

@article{Wang_1985, title={Calculation of the electron velocity distribution in high electron mobility transistors using an ensemble Monte Carlo method}, volume={57}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.334851}, DOI={10.1063/1.334851}, number={12}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Wang, T. and Hess, K.}, year={1985}, month=jun, pages={5336–5339} }