Abstract
Self-heating effects are investigated in silicon-on-insulator (SOI), silicon-germanium-on-insulator (SGOI), and strained-silicon-directly-on-insulator (SSDOI) metal-oxide field-effect transistors (MOSFETs), using a Monte Carlo simulator self-consistently coupled with the solution of the heat diffusion equation. Although the influence of thermal effects is in general higher in these structures, as compared to bulk Si MOSFETs, its impact is much more important in SGOI and SSDOI FET structures incorporating ultrathin Si channels, with SGOI FETs giving the worst thermal performance. A study of the dependence of the extent of self-heating on the buried-oxide thickness is also performed, showing that this parameter is important in designing SOI structures with better thermal management.
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Dates
Type | When |
---|---|
Created | 15 years, 4 months ago (March 29, 2010, 6:43 p.m.) |
Deposited | 2 years, 1 month ago (July 5, 2023, 7:35 a.m.) |
Indexed | 4 weeks ago (July 30, 2025, 6:54 a.m.) |
Issued | 15 years, 5 months ago (March 15, 2010) |
Published | 15 years, 5 months ago (March 15, 2010) |
Published Online | 15 years, 4 months ago (March 29, 2010) |
Published Print | 15 years, 5 months ago (March 15, 2010) |
@article{Sadi_2010, title={Monte Carlo study of the electrothermal phenomenon in silicon-on-insulator and silicon-germanium-on-insulator metal-oxide field-effect transistors}, volume={107}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.3345684}, DOI={10.1063/1.3345684}, number={6}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Sadi, Toufik and Kelsall, Robert W.}, year={2010}, month=mar }