Abstract
We report measurements of the zero field photorefractive sensitivity (optical damage) of waveguides fabricated by silver ion exchange in both LiNbO3 and LiTaO3 and of LiNbO3 :Ti guides diffused in the presence of H20. Marked differences in the photorefractive sensitivity are found for the different fabrication proceseses. In particular, LiNbO3 :Ti guides diffused in the presence of H20 were significantly less susceptible to optical damage than those diffused in a dry atmosphere, and no index changes were observed in LiTaO3 :Ag waveguides for exposures up to 105 J/cm2 at 4579 Å.
References
6
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 14, 2003, 5:56 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 4, 2024, 7 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 5, 2024, 9:25 a.m.) |
Issued | 44 years, 1 month ago (July 1, 1981) |
Published | 44 years, 1 month ago (July 1, 1981) |
Published Print | 44 years, 1 month ago (July 1, 1981) |
@article{Jackel_1981, title={Optical damage resistance of monovalent ion diffused LiNbO3 and LiTaO3 waveguides}, volume={52}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.329284}, DOI={10.1063/1.329284}, number={7}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Jackel, J. L. and Olson, D. H. and Glass, A. M.}, year={1981}, month=jul, pages={4855–4856} }