Abstract
Polycrystalline transparent semiconducting zinc oxide films have been deposited by the oxidation of diethyl zinc. The film growth rate is controlled by a complex multistep oxidation process which is dominated by radical reactions. The effect of substrate temperature and gas pressures have been studied. Samples deposited between 280 and 350 °C have a conductivity varying from 10−2 to 50 Ω−1 cm−1. The electrical properties of the films which are typical of polycrystalline material with small crystallites are shown to depend very closely on the film growth conditions. A study of oxygen chemisorption at grain boundaries confirms the importance of grain boundary effects in ZnO polycrystalline films.
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Dates
Type | When |
---|---|
Created | 22 years, 6 months ago (Feb. 14, 2003, 5:56 p.m.) |
Deposited | 1 year, 6 months ago (Feb. 4, 2024, 7:09 p.m.) |
Indexed | 3 weeks, 1 day ago (Aug. 12, 2025, 5:50 p.m.) |
Issued | 43 years, 10 months ago (Nov. 1, 1981) |
Published | 43 years, 10 months ago (Nov. 1, 1981) |
Published Print | 43 years, 10 months ago (Nov. 1, 1981) |
@article{Roth_1981, title={Properties of zinc oxide films prepared by the oxidation of diethyl zinc}, volume={52}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.328618}, DOI={10.1063/1.328618}, number={11}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Roth, A. P. and Williams, D. F.}, year={1981}, month=nov, pages={6685–6692} }