Crossref journal-article
AIP Publishing
Journal of Applied Physics (317)
Abstract

A theory for the capacitance of junctions (in particular, Schottky barriers) made from amorphous semiconductors is presented. It is emphasized that this theory is very different from the usual theory used for crystalline semiconductors. A self-consistent scheme to use the capacitance results to find the density of localized states in the band gap of amorphous semiconductors is developed. This method provides a strong complement to the field-effect technique for finding the density of states. Theoretical calculations are presented to illustrate the procedure and some of its advantages over the field-effect method. The relation to earlier work is discussed.

Bibliography

Singh, J., & Cohen, M. H. (1980). Capacitance-voltage measurements in amorphous Schottky barriers. Journal of Applied Physics, 51(1), 413–418.

Authors 2
  1. Jasprit Singh (first)
  2. Morrel H. Cohen (additional)
References 13 Referenced 22
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Dates
Type When
Created 22 years, 6 months ago (Feb. 14, 2003, 5:37 p.m.)
Deposited 1 year, 6 months ago (Feb. 4, 2024, 5:28 p.m.)
Indexed 1 year, 6 months ago (Feb. 5, 2024, 8:45 a.m.)
Issued 45 years, 7 months ago (Jan. 1, 1980)
Published 45 years, 7 months ago (Jan. 1, 1980)
Published Print 45 years, 7 months ago (Jan. 1, 1980)
Funders 0

None

@article{Singh_1980, title={Capacitance-voltage measurements in amorphous Schottky barriers}, volume={51}, ISSN={1089-7550}, url={http://dx.doi.org/10.1063/1.327389}, DOI={10.1063/1.327389}, number={1}, journal={Journal of Applied Physics}, publisher={AIP Publishing}, author={Singh, Jasprit and Cohen, Morrel H.}, year={1980}, month=jan, pages={413–418} }